JPS55147629A - Photomask substrate working method - Google Patents

Photomask substrate working method

Info

Publication number
JPS55147629A
JPS55147629A JP5569279A JP5569279A JPS55147629A JP S55147629 A JPS55147629 A JP S55147629A JP 5569279 A JP5569279 A JP 5569279A JP 5569279 A JP5569279 A JP 5569279A JP S55147629 A JPS55147629 A JP S55147629A
Authority
JP
Japan
Prior art keywords
substrate
photomask
pinholes
chamfering
covered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5569279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6140100B2 (enrdf_load_stackoverflow
Inventor
Kaoru Asao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP5569279A priority Critical patent/JPS55147629A/ja
Publication of JPS55147629A publication Critical patent/JPS55147629A/ja
Publication of JPS6140100B2 publication Critical patent/JPS6140100B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP5569279A 1979-05-09 1979-05-09 Photomask substrate working method Granted JPS55147629A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5569279A JPS55147629A (en) 1979-05-09 1979-05-09 Photomask substrate working method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5569279A JPS55147629A (en) 1979-05-09 1979-05-09 Photomask substrate working method

Publications (2)

Publication Number Publication Date
JPS55147629A true JPS55147629A (en) 1980-11-17
JPS6140100B2 JPS6140100B2 (enrdf_load_stackoverflow) 1986-09-08

Family

ID=13005944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5569279A Granted JPS55147629A (en) 1979-05-09 1979-05-09 Photomask substrate working method

Country Status (1)

Country Link
JP (1) JPS55147629A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005333124A (ja) * 2004-04-22 2005-12-02 Asahi Glass Co Ltd 反射型マスク用低膨張硝子基板および反射型マスク
JPWO2021229968A1 (enrdf_load_stackoverflow) * 2020-05-13 2021-11-18
JPWO2021229967A1 (enrdf_load_stackoverflow) * 2020-05-13 2021-11-18

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005333124A (ja) * 2004-04-22 2005-12-02 Asahi Glass Co Ltd 反射型マスク用低膨張硝子基板および反射型マスク
JPWO2021229968A1 (enrdf_load_stackoverflow) * 2020-05-13 2021-11-18
JPWO2021229967A1 (enrdf_load_stackoverflow) * 2020-05-13 2021-11-18

Also Published As

Publication number Publication date
JPS6140100B2 (enrdf_load_stackoverflow) 1986-09-08

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