JPS55138255A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS55138255A JPS55138255A JP4423379A JP4423379A JPS55138255A JP S55138255 A JPS55138255 A JP S55138255A JP 4423379 A JP4423379 A JP 4423379A JP 4423379 A JP4423379 A JP 4423379A JP S55138255 A JPS55138255 A JP S55138255A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- wiring
- hillock
- occurrence
- tial3
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4423379A JPS55138255A (en) | 1979-04-13 | 1979-04-13 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4423379A JPS55138255A (en) | 1979-04-13 | 1979-04-13 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55138255A true JPS55138255A (en) | 1980-10-28 |
Family
ID=12685807
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4423379A Pending JPS55138255A (en) | 1979-04-13 | 1979-04-13 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55138255A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4576659A (en) * | 1982-12-02 | 1986-03-18 | International Business Machines Corporation | Process for inhibiting metal migration during heat cycling of multilayer thin metal film structures |
EP0614217A1 (en) * | 1993-03-01 | 1994-09-07 | Motorola, Inc. | A process for forming an intermetallic layer and a device formed by the process |
USRE37032E1 (en) | 1985-05-06 | 2001-01-30 | The Board Of Trustees Of The Leland Stanford Jr. University | Layered and homogeneous films of aluminum and aluminum/silicon with titanium and tungsten for multilevel interconnects |
-
1979
- 1979-04-13 JP JP4423379A patent/JPS55138255A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4576659A (en) * | 1982-12-02 | 1986-03-18 | International Business Machines Corporation | Process for inhibiting metal migration during heat cycling of multilayer thin metal film structures |
USRE37032E1 (en) | 1985-05-06 | 2001-01-30 | The Board Of Trustees Of The Leland Stanford Jr. University | Layered and homogeneous films of aluminum and aluminum/silicon with titanium and tungsten for multilevel interconnects |
EP0614217A1 (en) * | 1993-03-01 | 1994-09-07 | Motorola, Inc. | A process for forming an intermetallic layer and a device formed by the process |
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