JPS55132066A - Hall effect semiconductor integrated circuit - Google Patents

Hall effect semiconductor integrated circuit

Info

Publication number
JPS55132066A
JPS55132066A JP3998979A JP3998979A JPS55132066A JP S55132066 A JPS55132066 A JP S55132066A JP 3998979 A JP3998979 A JP 3998979A JP 3998979 A JP3998979 A JP 3998979A JP S55132066 A JPS55132066 A JP S55132066A
Authority
JP
Japan
Prior art keywords
hall element
element part
conductive layer
current
channeled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3998979A
Other languages
Japanese (ja)
Other versions
JPS6214115B2 (en
Inventor
Atsutomo Toi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP3998979A priority Critical patent/JPS55132066A/en
Publication of JPS55132066A publication Critical patent/JPS55132066A/en
Publication of JPS6214115B2 publication Critical patent/JPS6214115B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To improve sensitivity of IC incorporated in a Hall element by a method wherein a channeled conductive layer same in conductivity as a Hall element part and in high impurity density is formed in the Hall element part, and an unbalance of primary current in the Hall element is corrected.
CONSTITUTION: A Hall element part 11 isolated with a pn-junction 10 is provided in an Si substrate 9, and a plural channeled conductive layer is formed on the surface layer. A suitable mask is used for formation of the layer 12, an impurity same in conductivity as the Hall element part 11 is doped at high density through ion implantation, and the passage of current is regulated at this part to improve sharply an uneven current distribution due to unevenness of a carrier distribution in the Hall element and crystal defect. Consequently, when a magnetic field is zero, an unbalance of potential between current collector electrodes 4 and 5 is improved, the value of an offset magnetic field can be minimized, thus improving an IC sensitivity incorporated in the Hall element. The conductive layer 12 may be provided on the bottom or in the middle of the Hall element part 11, and its longitudinal division into two parts is also effective.
COPYRIGHT: (C)1980,JPO&Japio
JP3998979A 1979-04-02 1979-04-02 Hall effect semiconductor integrated circuit Granted JPS55132066A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3998979A JPS55132066A (en) 1979-04-02 1979-04-02 Hall effect semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3998979A JPS55132066A (en) 1979-04-02 1979-04-02 Hall effect semiconductor integrated circuit

Publications (2)

Publication Number Publication Date
JPS55132066A true JPS55132066A (en) 1980-10-14
JPS6214115B2 JPS6214115B2 (en) 1987-03-31

Family

ID=12568341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3998979A Granted JPS55132066A (en) 1979-04-02 1979-04-02 Hall effect semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPS55132066A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7372119B2 (en) 2001-10-01 2008-05-13 Asahi Kasei Microsystems Co., Ltd. Cross-shaped Hall device having extensions with slits
US7843190B2 (en) 2005-12-16 2010-11-30 Asahi Kasei Emd Corporation Position detection apparatus
CN103956427A (en) * 2014-04-01 2014-07-30 友达光电股份有限公司 Sensing element

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7372119B2 (en) 2001-10-01 2008-05-13 Asahi Kasei Microsystems Co., Ltd. Cross-shaped Hall device having extensions with slits
US7843190B2 (en) 2005-12-16 2010-11-30 Asahi Kasei Emd Corporation Position detection apparatus
CN103956427A (en) * 2014-04-01 2014-07-30 友达光电股份有限公司 Sensing element
US9590172B2 (en) 2014-04-01 2017-03-07 Au Optronics Corporation Sensing device

Also Published As

Publication number Publication date
JPS6214115B2 (en) 1987-03-31

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