JPS55124231A - Formation method for minute pattern - Google Patents

Formation method for minute pattern

Info

Publication number
JPS55124231A
JPS55124231A JP3279679A JP3279679A JPS55124231A JP S55124231 A JPS55124231 A JP S55124231A JP 3279679 A JP3279679 A JP 3279679A JP 3279679 A JP3279679 A JP 3279679A JP S55124231 A JPS55124231 A JP S55124231A
Authority
JP
Japan
Prior art keywords
pattern
region
ultraviolet rays
right sides
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3279679A
Other languages
English (en)
Other versions
JPS5942975B2 (ja
Inventor
Kazutoshi Nagano
Hideko Mitsunari
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP54032796A priority Critical patent/JPS5942975B2/ja
Publication of JPS55124231A publication Critical patent/JPS55124231A/ja
Publication of JPS5942975B2 publication Critical patent/JPS5942975B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP54032796A 1979-03-19 1979-03-19 微細パタ−ンの形成方法 Expired JPS5942975B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54032796A JPS5942975B2 (ja) 1979-03-19 1979-03-19 微細パタ−ンの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54032796A JPS5942975B2 (ja) 1979-03-19 1979-03-19 微細パタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS55124231A true JPS55124231A (en) 1980-09-25
JPS5942975B2 JPS5942975B2 (ja) 1984-10-18

Family

ID=12368802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54032796A Expired JPS5942975B2 (ja) 1979-03-19 1979-03-19 微細パタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS5942975B2 (ja)

Also Published As

Publication number Publication date
JPS5942975B2 (ja) 1984-10-18

Similar Documents

Publication Publication Date Title
JPS5228875A (en) Mask
DE3066818D1 (en) Photoresist films, processes for their production and process for modifying substrate surfaces
JPS56128946A (en) Photomask correcting method
JPS55124231A (en) Formation method for minute pattern
JPS5785237A (en) X-ray mask
JPS5312942A (en) Films for agricultural applications
JPS55163539A (en) Photo mask
JPS5596952A (en) Production of photomask
JPS53122427A (en) Forming method for photo-resist pattern
JPS5760277A (en) Solar cell for wrist watch
JPS5437579A (en) Chrome plate
JPS5689741A (en) Dryplate for photomasking
JPS57102015A (en) Pattern formation
JPS52152171A (en) Wafer alignment method
JPS5767930A (en) Photomask
JPS5322369A (en) Flaw mending method of photo mask materials
JPS5732190A (en) Manufacture of stripe filter surface plate
JPS5382444A (en) Surface treating method of liquid crystal panel
JPS52140550A (en) Manufacture of colored, coated metal plates
JPS5351973A (en) Photo mask
JPS5744150A (en) Photomask
JPS544077A (en) Photo mask for far ultraviolet ray exposure
JPS52102343A (en) Process for forming paint film with slurry-paint
JPS5379387A (en) Optical mask
JPS5413269A (en) Forming method of two layer protective film