JPS55120136A - Method for sensing positioning mark in electron-beam lithography - Google Patents

Method for sensing positioning mark in electron-beam lithography

Info

Publication number
JPS55120136A
JPS55120136A JP2773079A JP2773079A JPS55120136A JP S55120136 A JPS55120136 A JP S55120136A JP 2773079 A JP2773079 A JP 2773079A JP 2773079 A JP2773079 A JP 2773079A JP S55120136 A JPS55120136 A JP S55120136A
Authority
JP
Japan
Prior art keywords
scanning
mark
sensed
electron
counted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2773079A
Other languages
Japanese (ja)
Other versions
JPS5713135B2 (en
Inventor
Shojiro Asai
Isamu Oda
Masahide Okumura
Akihira Fujinami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP2773079A priority Critical patent/JPS55120136A/en
Publication of JPS55120136A publication Critical patent/JPS55120136A/en
Publication of JPS5713135B2 publication Critical patent/JPS5713135B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To determin the position of a positioning mark highly accurately, by performing electron-beam scanning along the paths crossing at a mark from the two different points, and sensing the scanning speed of the beam by using the difference in time lengths from the beginning of the scanning and to sensing of the mark. CONSTITUTION:An electron beam is scanned along a path 301 from a point X0- X1, and the beam is turned on and off during the scanning. Scattering of electrons, when the beam crosses a target 302, is sensed; and the time, when the sensed signal crosses a threshold level 303, is sensed. The period from the beginning of the beam scanning to the time at which the threshold crossing is sensed is counted N1-N4 by a counter which is connected to an oscillator with a specified frequency. Then, scanning from a point X0' which is well separated from the point X0 is counted at the same speed to obtain the values N1'-N4'. The scanning speed C is obtained by dividing the distance (X0-X0') by the difference in the arithmetic means of the counted values. The position of the mark can be obtained by X0+C(N1+... +N4)/4 very accurately, and is not affected by the scanning speed of the beam.
JP2773079A 1979-03-12 1979-03-12 Method for sensing positioning mark in electron-beam lithography Granted JPS55120136A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2773079A JPS55120136A (en) 1979-03-12 1979-03-12 Method for sensing positioning mark in electron-beam lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2773079A JPS55120136A (en) 1979-03-12 1979-03-12 Method for sensing positioning mark in electron-beam lithography

Publications (2)

Publication Number Publication Date
JPS55120136A true JPS55120136A (en) 1980-09-16
JPS5713135B2 JPS5713135B2 (en) 1982-03-15

Family

ID=12229129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2773079A Granted JPS55120136A (en) 1979-03-12 1979-03-12 Method for sensing positioning mark in electron-beam lithography

Country Status (1)

Country Link
JP (1) JPS55120136A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5258706A (en) * 1991-10-16 1993-11-02 Siemens Aktiengesellschaft Method for the recognition of testing errors in the test of microwirings

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5258706A (en) * 1991-10-16 1993-11-02 Siemens Aktiengesellschaft Method for the recognition of testing errors in the test of microwirings
US5373233A (en) * 1991-10-16 1994-12-13 Siemens Aktiengesellschaft Method for the recognition of testing errors in the test of microwirings

Also Published As

Publication number Publication date
JPS5713135B2 (en) 1982-03-15

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