JPS55110777A - Plasma treating apparatus - Google Patents
Plasma treating apparatusInfo
- Publication number
- JPS55110777A JPS55110777A JP1926379A JP1926379A JPS55110777A JP S55110777 A JPS55110777 A JP S55110777A JP 1926379 A JP1926379 A JP 1926379A JP 1926379 A JP1926379 A JP 1926379A JP S55110777 A JPS55110777 A JP S55110777A
- Authority
- JP
- Japan
- Prior art keywords
- substrate plate
- high frequency
- movement
- container
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To reduce treatment irregularity by carrying out plasma treatment between substrate plates or within a substrate plate uniformly by a mechanism wherein, in case of imparting reciprocal movement to an axial direction of a vacuum container and rotary movement around an axis to a substrate plate putting table, at least the former movement is imparted.
CONSTITUTION: A support 2 for supporting a substrate plate 1 is put on a substrate plate putting table 24 and, after a top cover 11 is put on a vacuum container 10 to close and evacuated from an exhaust port 20, a high purity gas is introduced from a gas introducing port 19. When gas pressure in a container 10 becomes constant, a rotary shaft 21 is rotated at a constant angular speed. Thereby, the movement of a guide pin 25 is initiated on a guide groove 22 and a container 10 is reciprocally moved to an axial direction because the rotation of a putting table 24 attached by a pin 25 is prevented by a stopper 29. Subsequently, high frequency electric power is applied to a high frequency electrode 18 by operating a high frequency oscillator 17 to generate plasma and a substrate plate 1 is subjected to etching treatment by plasma for a predetermined period.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1926379A JPS55110777A (en) | 1979-02-20 | 1979-02-20 | Plasma treating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1926379A JPS55110777A (en) | 1979-02-20 | 1979-02-20 | Plasma treating apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55110777A true JPS55110777A (en) | 1980-08-26 |
Family
ID=11994545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1926379A Pending JPS55110777A (en) | 1979-02-20 | 1979-02-20 | Plasma treating apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55110777A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58168230A (en) * | 1982-03-30 | 1983-10-04 | Fujitsu Ltd | Microwave plasma processing method |
-
1979
- 1979-02-20 JP JP1926379A patent/JPS55110777A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58168230A (en) * | 1982-03-30 | 1983-10-04 | Fujitsu Ltd | Microwave plasma processing method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5687672A (en) | Dry etching apparatus | |
JPS55134175A (en) | Microwave plasma etching unit | |
JPS55110777A (en) | Plasma treating apparatus | |
JPS5676242A (en) | Treating apparatus using gas plasma reaction | |
JPS5588335A (en) | Automatic conveying mechanism for plasma etching/ stripping device | |
JPS5645761A (en) | Plasma reaction apparatus | |
JPS5298475A (en) | Plasma treating apparatus | |
JPS5582782A (en) | Dry etching method | |
JPS54125143A (en) | Treating device using hydrogen fluoride-containing gas | |
JPS5521553A (en) | Device for fabricating film | |
JPS5721813A (en) | Forming method for film | |
JPS5565436A (en) | Plasma treatment device | |
JPS5497375A (en) | Cylindrical plasma processor | |
JPS5693873A (en) | Ion nitridation apparatus | |
JPS55145172A (en) | Forming apparatus for film | |
JPS5477573A (en) | Operating method of plasma treating apparatus | |
JPS61194726A (en) | Plasma processing unit | |
JPS5210872A (en) | Apparatus for production of compound thin films | |
JPS56130474A (en) | Dry etching apparatus | |
JPS60109233A (en) | Plasma treatment device | |
JPS5696837A (en) | Dry etching device | |
JPS57184224A (en) | Microwave plasma treating method and its device | |
JPS6372122A (en) | Plasma etching and device therefor | |
JPS55119175A (en) | Reactive ion etching method | |
JPS5613481A (en) | Etching apparatus |