JPS55102228A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS55102228A
JPS55102228A JP815479A JP815479A JPS55102228A JP S55102228 A JPS55102228 A JP S55102228A JP 815479 A JP815479 A JP 815479A JP 815479 A JP815479 A JP 815479A JP S55102228 A JPS55102228 A JP S55102228A
Authority
JP
Japan
Prior art keywords
sample
cassette
displacement
stored
location
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP815479A
Other languages
Japanese (ja)
Inventor
Kiichi Takamoto
Akinori Shibayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP815479A priority Critical patent/JPS55102228A/en
Publication of JPS55102228A publication Critical patent/JPS55102228A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Abstract

PURPOSE:To perform the exposure efficiently by previously obtaining information of both the vertical displacement of the surface of a sample and the location adjustment before exposing the electron beam. CONSTITUTION:The sample 1 is put into the cassette 2 in the sample exchange room 8, the cassette is placed on the stage 9 and set to the initial location. The displacement Z of the sample in the coordinates (O,Y) is measured and stored in the memory 29. After the coordinates and displacement over the whole surface are stored, the cassette is set in a fixed location on the XY stage 19 of the sample room 17. Next, the substrate marks 23, 24 are detected, the beam application position is computed at 27 according to the stored data, the compensation is also added to it, the pattern is exposed in the area. In this way, when the information of both the vertical displacement and location adjustment is used to compensate the beam application position, a picture with a high precision can be obtained even by 1/10 the traditional adjusting mark, the time required for detecting the mark can be reduced.
JP815479A 1979-01-29 1979-01-29 Electron beam exposure device Pending JPS55102228A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP815479A JPS55102228A (en) 1979-01-29 1979-01-29 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP815479A JPS55102228A (en) 1979-01-29 1979-01-29 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS55102228A true JPS55102228A (en) 1980-08-05

Family

ID=11685396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP815479A Pending JPS55102228A (en) 1979-01-29 1979-01-29 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS55102228A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59150422A (en) * 1983-01-31 1984-08-28 Fujitsu Ltd Exposure process
JPS62128628U (en) * 1986-02-07 1987-08-14

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59150422A (en) * 1983-01-31 1984-08-28 Fujitsu Ltd Exposure process
JPH0352210B2 (en) * 1983-01-31 1991-08-09 Fujitsu Ltd
JPS62128628U (en) * 1986-02-07 1987-08-14

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