JPS548455A - Cleansing/drying device for products - Google Patents
Cleansing/drying device for productsInfo
- Publication number
- JPS548455A JPS548455A JP7320977A JP7320977A JPS548455A JP S548455 A JPS548455 A JP S548455A JP 7320977 A JP7320977 A JP 7320977A JP 7320977 A JP7320977 A JP 7320977A JP S548455 A JPS548455 A JP S548455A
- Authority
- JP
- Japan
- Prior art keywords
- cleansing
- drying device
- products
- negative pressure
- drying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To secure an automatic and perfect cleansing and drying for the cleansing/drying device of the semiconductor wafer, by providing a pipe extending to outside of the process room at the cleansing solution flowing path at the tip portion of the nozzle and also connecting a negative pressure mechanism which gives a negative pressure atmosphere after cleansing.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7320977A JPS548455A (en) | 1977-06-22 | 1977-06-22 | Cleansing/drying device for products |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7320977A JPS548455A (en) | 1977-06-22 | 1977-06-22 | Cleansing/drying device for products |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS548455A true JPS548455A (en) | 1979-01-22 |
Family
ID=13511524
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7320977A Pending JPS548455A (en) | 1977-06-22 | 1977-06-22 | Cleansing/drying device for products |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS548455A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5844838U (en) * | 1981-09-21 | 1983-03-25 | 三菱電機株式会社 | Wafer cleaning and drying equipment |
JPS61179741U (en) * | 1985-04-25 | 1986-11-10 | ||
JPS6232530U (en) * | 1985-08-09 | 1987-02-26 | ||
JPS6287434U (en) * | 1985-11-21 | 1987-06-04 | ||
JPH01110736A (en) * | 1987-10-23 | 1989-04-27 | Tokyo Electron Ltd | Cleaning by rinser dryer |
JPH04222676A (en) * | 1990-03-15 | 1992-08-12 | Sl Electrostatic Technol Inc | Method for steam washing of layered part |
JP2008504674A (en) * | 2004-06-14 | 2008-02-14 | エフエスアイ インターナショナル インコーポレイテッド | Apparatus and method for draining and drying liquid on one or more wafers |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4935435A (en) * | 1972-08-09 | 1974-04-02 |
-
1977
- 1977-06-22 JP JP7320977A patent/JPS548455A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4935435A (en) * | 1972-08-09 | 1974-04-02 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5844838U (en) * | 1981-09-21 | 1983-03-25 | 三菱電機株式会社 | Wafer cleaning and drying equipment |
JPS61179741U (en) * | 1985-04-25 | 1986-11-10 | ||
JPS6232530U (en) * | 1985-08-09 | 1987-02-26 | ||
JPH0513008Y2 (en) * | 1985-08-09 | 1993-04-06 | ||
JPS6287434U (en) * | 1985-11-21 | 1987-06-04 | ||
JPH01110736A (en) * | 1987-10-23 | 1989-04-27 | Tokyo Electron Ltd | Cleaning by rinser dryer |
JPH04222676A (en) * | 1990-03-15 | 1992-08-12 | Sl Electrostatic Technol Inc | Method for steam washing of layered part |
JP2008504674A (en) * | 2004-06-14 | 2008-02-14 | エフエスアイ インターナショナル インコーポレイテッド | Apparatus and method for draining and drying liquid on one or more wafers |
JP4807528B2 (en) * | 2004-06-14 | 2011-11-02 | エフエスアイ インターナショナル インコーポレイテッド | Apparatus and method for draining and drying liquid on one or more wafers |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5212576A (en) | Wafer washing drying device | |
JPS51143213A (en) | Air break apparatus to actas break pipe and air reservoir pipe | |
JPS548455A (en) | Cleansing/drying device for products | |
JPS51136208A (en) | Voice recognition device for limited words | |
JPS5230167A (en) | Method for production of semiconductor device | |
JPS51130176A (en) | Semiconductor device process | |
JPS5221574A (en) | Vacuum multiplying force device | |
JPS51133847A (en) | Drying apparatus for pipe | |
JPS5216171A (en) | Mask fitting device | |
JPS5234471A (en) | Vapor water separating device | |
JPS522164A (en) | Wafer cleaning and drying device | |
JPS51120510A (en) | Device for preventing the error departure of train | |
JPS5219071A (en) | Production method of semiconductor device | |
JPS547869A (en) | Lead bending method of semiconductor device | |
JPS525268A (en) | Rotary coating device | |
JPS5215322A (en) | Automatic focusing device | |
JPS5241465A (en) | Arm nozzle for a tableware cleaning apparatus | |
JPS51112279A (en) | Semiconductor device | |
JPS5433382A (en) | Making of bulb | |
JPS5364473A (en) | Production of semiconductor device and its apparatus | |
JPS51118369A (en) | Manufacturing process for simiconduator unit | |
JPS51134418A (en) | A hose joint | |
JPS5429978A (en) | Carrier device for semiconductor wafer and mask | |
JPS51123949A (en) | Process for drying and device thereof | |
JPS526293A (en) | Packaging method with flexible pipe |