JPS548455A - Cleansing/drying device for products - Google Patents

Cleansing/drying device for products

Info

Publication number
JPS548455A
JPS548455A JP7320977A JP7320977A JPS548455A JP S548455 A JPS548455 A JP S548455A JP 7320977 A JP7320977 A JP 7320977A JP 7320977 A JP7320977 A JP 7320977A JP S548455 A JPS548455 A JP S548455A
Authority
JP
Japan
Prior art keywords
cleansing
drying device
products
negative pressure
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7320977A
Other languages
Japanese (ja)
Inventor
Hiroto Nagatomo
Hisao Seki
Shogo Kiyota
Tetsuya Mizutani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7320977A priority Critical patent/JPS548455A/en
Publication of JPS548455A publication Critical patent/JPS548455A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To secure an automatic and perfect cleansing and drying for the cleansing/drying device of the semiconductor wafer, by providing a pipe extending to outside of the process room at the cleansing solution flowing path at the tip portion of the nozzle and also connecting a negative pressure mechanism which gives a negative pressure atmosphere after cleansing.
COPYRIGHT: (C)1979,JPO&Japio
JP7320977A 1977-06-22 1977-06-22 Cleansing/drying device for products Pending JPS548455A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7320977A JPS548455A (en) 1977-06-22 1977-06-22 Cleansing/drying device for products

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7320977A JPS548455A (en) 1977-06-22 1977-06-22 Cleansing/drying device for products

Publications (1)

Publication Number Publication Date
JPS548455A true JPS548455A (en) 1979-01-22

Family

ID=13511524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7320977A Pending JPS548455A (en) 1977-06-22 1977-06-22 Cleansing/drying device for products

Country Status (1)

Country Link
JP (1) JPS548455A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5844838U (en) * 1981-09-21 1983-03-25 三菱電機株式会社 Wafer cleaning and drying equipment
JPS61179741U (en) * 1985-04-25 1986-11-10
JPS6232530U (en) * 1985-08-09 1987-02-26
JPS6287434U (en) * 1985-11-21 1987-06-04
JPH01110736A (en) * 1987-10-23 1989-04-27 Tokyo Electron Ltd Cleaning by rinser dryer
JPH04222676A (en) * 1990-03-15 1992-08-12 Sl Electrostatic Technol Inc Method for steam washing of layered part
JP2008504674A (en) * 2004-06-14 2008-02-14 エフエスアイ インターナショナル インコーポレイテッド Apparatus and method for draining and drying liquid on one or more wafers

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4935435A (en) * 1972-08-09 1974-04-02

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4935435A (en) * 1972-08-09 1974-04-02

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5844838U (en) * 1981-09-21 1983-03-25 三菱電機株式会社 Wafer cleaning and drying equipment
JPS61179741U (en) * 1985-04-25 1986-11-10
JPS6232530U (en) * 1985-08-09 1987-02-26
JPH0513008Y2 (en) * 1985-08-09 1993-04-06
JPS6287434U (en) * 1985-11-21 1987-06-04
JPH01110736A (en) * 1987-10-23 1989-04-27 Tokyo Electron Ltd Cleaning by rinser dryer
JPH04222676A (en) * 1990-03-15 1992-08-12 Sl Electrostatic Technol Inc Method for steam washing of layered part
JP2008504674A (en) * 2004-06-14 2008-02-14 エフエスアイ インターナショナル インコーポレイテッド Apparatus and method for draining and drying liquid on one or more wafers
JP4807528B2 (en) * 2004-06-14 2011-11-02 エフエスアイ インターナショナル インコーポレイテッド Apparatus and method for draining and drying liquid on one or more wafers

Similar Documents

Publication Publication Date Title
JPS5212576A (en) Wafer washing drying device
JPS51143213A (en) Air break apparatus to actas break pipe and air reservoir pipe
JPS548455A (en) Cleansing/drying device for products
JPS51136208A (en) Voice recognition device for limited words
JPS5230167A (en) Method for production of semiconductor device
JPS51130176A (en) Semiconductor device process
JPS5221574A (en) Vacuum multiplying force device
JPS51133847A (en) Drying apparatus for pipe
JPS5216171A (en) Mask fitting device
JPS5234471A (en) Vapor water separating device
JPS522164A (en) Wafer cleaning and drying device
JPS51120510A (en) Device for preventing the error departure of train
JPS5219071A (en) Production method of semiconductor device
JPS547869A (en) Lead bending method of semiconductor device
JPS525268A (en) Rotary coating device
JPS5215322A (en) Automatic focusing device
JPS5241465A (en) Arm nozzle for a tableware cleaning apparatus
JPS51112279A (en) Semiconductor device
JPS5433382A (en) Making of bulb
JPS5364473A (en) Production of semiconductor device and its apparatus
JPS51118369A (en) Manufacturing process for simiconduator unit
JPS51134418A (en) A hose joint
JPS5429978A (en) Carrier device for semiconductor wafer and mask
JPS51123949A (en) Process for drying and device thereof
JPS526293A (en) Packaging method with flexible pipe