JPS6287434U - - Google Patents
Info
- Publication number
- JPS6287434U JPS6287434U JP17941985U JP17941985U JPS6287434U JP S6287434 U JPS6287434 U JP S6287434U JP 17941985 U JP17941985 U JP 17941985U JP 17941985 U JP17941985 U JP 17941985U JP S6287434 U JPS6287434 U JP S6287434U
- Authority
- JP
- Japan
- Prior art keywords
- rotating table
- wafer
- shielding means
- rotating
- opposite side
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
第1図は本考案装置の概略側面図、第2図は一
部省略した正面図、第3図は遮蔽手段の他の実施
例を示した断面図である。第4図は従来装置の側
面図、第5図は従来装置の要部平面図である。
1……半導体ウエーハ、3……回転台、11…
…回転ドラム、17……遮蔽手段。
FIG. 1 is a schematic side view of the device of the present invention, FIG. 2 is a partially omitted front view, and FIG. 3 is a sectional view showing another embodiment of the shielding means. FIG. 4 is a side view of the conventional device, and FIG. 5 is a plan view of essential parts of the conventional device. 1... Semiconductor wafer, 3... Turntable, 11...
...rotating drum, 17...shielding means.
Claims (1)
転台と、回転台の上方位置に回動可能に支持され
、かつ、水液を上記ウエーハへ噴射する回転ドラ
ムと、回転ドラムから水液のウエーハと反対側へ
の飛散を防止する遮蔽手段とからなる半導体製造
装置。 A rotating table on which a semiconductor wafer is rotatably placed and fixed; a rotating drum rotatably supported above the rotating table and injecting aqueous liquid onto the wafer; Semiconductor manufacturing equipment comprising a shielding means for preventing scattering to the opposite side.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17941985U JPS6287434U (en) | 1985-11-21 | 1985-11-21 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17941985U JPS6287434U (en) | 1985-11-21 | 1985-11-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6287434U true JPS6287434U (en) | 1987-06-04 |
Family
ID=31122463
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17941985U Pending JPS6287434U (en) | 1985-11-21 | 1985-11-21 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6287434U (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS548455A (en) * | 1977-06-22 | 1979-01-22 | Hitachi Ltd | Cleansing/drying device for products |
JPS5544780A (en) * | 1978-09-27 | 1980-03-29 | Toshiba Corp | Cleaning device for semiconductor wafer |
-
1985
- 1985-11-21 JP JP17941985U patent/JPS6287434U/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS548455A (en) * | 1977-06-22 | 1979-01-22 | Hitachi Ltd | Cleansing/drying device for products |
JPS5544780A (en) * | 1978-09-27 | 1980-03-29 | Toshiba Corp | Cleaning device for semiconductor wafer |