JPS5481084A - Me/b-type charge transfer device - Google Patents
Me/b-type charge transfer deviceInfo
- Publication number
- JPS5481084A JPS5481084A JP14817977A JP14817977A JPS5481084A JP S5481084 A JPS5481084 A JP S5481084A JP 14817977 A JP14817977 A JP 14817977A JP 14817977 A JP14817977 A JP 14817977A JP S5481084 A JPS5481084 A JP S5481084A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- semiconductor substrate
- storage region
- potential
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/105—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components
- H01L27/1057—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components comprising charge coupled devices [CCD] or charge injection devices [CID]
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Networks Using Active Elements (AREA)
Abstract
PURPOSE:To ensure the steady charge injection at source potential OV by forming the conductive region different from the semiconductor substrate only on the inner surface of the substrate at the storage region. CONSTITUTION:High-impurity layer 20 of the conductive type opposite to the semiconductor substrate is formed on the inner surface of the substrate to become the storage region, and the equal impurity density to the substrate itself is secured on the inner surface of the substrate to be the barrier region. At the same time, conductive high-impurity layer 68 and 74 equal to storage region 73 as well as to the substrate are formed on the semiconductor substrate surface under each electrode at the input/output part. The potential higher than the electrode application voltage is kept on the semiconductor substrate surface at the input part, so the conditions for the cahrge injection can be satisfied even though the low level is identical between the source potential and the clock potential.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14817977A JPS5481084A (en) | 1977-12-12 | 1977-12-12 | Me/b-type charge transfer device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14817977A JPS5481084A (en) | 1977-12-12 | 1977-12-12 | Me/b-type charge transfer device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5481084A true JPS5481084A (en) | 1979-06-28 |
Family
ID=15447008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14817977A Pending JPS5481084A (en) | 1977-12-12 | 1977-12-12 | Me/b-type charge transfer device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5481084A (en) |
-
1977
- 1977-12-12 JP JP14817977A patent/JPS5481084A/en active Pending
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