JPS5469071A - Vapor deposition pre-processing method - Google Patents
Vapor deposition pre-processing methodInfo
- Publication number
- JPS5469071A JPS5469071A JP13572477A JP13572477A JPS5469071A JP S5469071 A JPS5469071 A JP S5469071A JP 13572477 A JP13572477 A JP 13572477A JP 13572477 A JP13572477 A JP 13572477A JP S5469071 A JPS5469071 A JP S5469071A
- Authority
- JP
- Japan
- Prior art keywords
- film
- evaporation
- residue
- incineration
- ozone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To form the evaporation film which features high adhesive force and causes no step break of the wiring through evaporation after the residue is removed through the sputtering process via the inactive gas of the incineration with O2.
CONSTITUTION: The complete removal of the resist film is difficult by the photo resist process before evaporation, so the organic matters and the impurities remain on the surface of the PSG film or the like. As a result, the step coverage is deteriorated to produce the step break for the wiring evpaporation film of the device. In this connection, the ozone sulphuric acid treatment is given to the opening surface of the electrode window before evaporation to remove the residue and then to have the incinaration process. Otherwise, the residue is removed only through the incineration process with no ozone sulphuric acid treatment, and then Al is evaporated. Thus, the step break is reduced greatly. The sputtering process in place of the incineration process can secure the same effect.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13572477A JPS5469071A (en) | 1977-11-14 | 1977-11-14 | Vapor deposition pre-processing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13572477A JPS5469071A (en) | 1977-11-14 | 1977-11-14 | Vapor deposition pre-processing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5469071A true JPS5469071A (en) | 1979-06-02 |
Family
ID=15158391
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13572477A Pending JPS5469071A (en) | 1977-11-14 | 1977-11-14 | Vapor deposition pre-processing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5469071A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57138139A (en) * | 1981-02-19 | 1982-08-26 | Nec Home Electronics Ltd | Etching method for insulating film of semiconductor device |
JPS5896412A (en) * | 1981-12-04 | 1983-06-08 | Fujitsu Ltd | Manufacture for piezo-electric vibrator |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50100973A (en) * | 1973-10-30 | 1975-08-11 | ||
JPS5121784A (en) * | 1974-08-17 | 1976-02-21 | Fujitsu Ltd | Handotaisochino seizohoho |
-
1977
- 1977-11-14 JP JP13572477A patent/JPS5469071A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50100973A (en) * | 1973-10-30 | 1975-08-11 | ||
JPS5121784A (en) * | 1974-08-17 | 1976-02-21 | Fujitsu Ltd | Handotaisochino seizohoho |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57138139A (en) * | 1981-02-19 | 1982-08-26 | Nec Home Electronics Ltd | Etching method for insulating film of semiconductor device |
JPS5896412A (en) * | 1981-12-04 | 1983-06-08 | Fujitsu Ltd | Manufacture for piezo-electric vibrator |
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