JPS544070A - Manufacture for semiconductor device - Google Patents

Manufacture for semiconductor device

Info

Publication number
JPS544070A
JPS544070A JP6891277A JP6891277A JPS544070A JP S544070 A JPS544070 A JP S544070A JP 6891277 A JP6891277 A JP 6891277A JP 6891277 A JP6891277 A JP 6891277A JP S544070 A JPS544070 A JP S544070A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
semiconductor wafer
photo resist
agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6891277A
Other languages
Japanese (ja)
Inventor
Takeshi Uryu
Manabu Matsuzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6891277A priority Critical patent/JPS544070A/en
Publication of JPS544070A publication Critical patent/JPS544070A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To prevent photo resist from being peeled off, by performing surface treatment to the semiconductor wafer with silane coupling agent and by increasing the adhesiveness of the photo resist agent to the SiO2 film on the semiconductor wafer surface.
COPYRIGHT: (C)1979,JPO&Japio
JP6891277A 1977-06-13 1977-06-13 Manufacture for semiconductor device Pending JPS544070A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6891277A JPS544070A (en) 1977-06-13 1977-06-13 Manufacture for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6891277A JPS544070A (en) 1977-06-13 1977-06-13 Manufacture for semiconductor device

Publications (1)

Publication Number Publication Date
JPS544070A true JPS544070A (en) 1979-01-12

Family

ID=13387332

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6891277A Pending JPS544070A (en) 1977-06-13 1977-06-13 Manufacture for semiconductor device

Country Status (1)

Country Link
JP (1) JPS544070A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6054255A (en) * 1996-08-01 2000-04-25 Matsushita Electric Industrial Co., Ltd. Pattern formation method and surface treating agent
US6258972B1 (en) 1995-08-03 2001-07-10 Matsushita Electric Industrial Co., Ltd. Pattern formation method and surface treating agent
JP2007520064A (en) * 2004-01-16 2007-07-19 ブルーワー サイエンス アイ エヌ シー． Spin-on protective coating for wet etching of microelectronic substrates

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6258972B1 (en) 1995-08-03 2001-07-10 Matsushita Electric Industrial Co., Ltd. Pattern formation method and surface treating agent
US6054255A (en) * 1996-08-01 2000-04-25 Matsushita Electric Industrial Co., Ltd. Pattern formation method and surface treating agent
JP2007520064A (en) * 2004-01-16 2007-07-19 ブルーワー サイエンス アイ エヌ シー． Spin-on protective coating for wet etching of microelectronic substrates

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