JPS5434776A - Wafer handling method of ion injector - Google Patents

Wafer handling method of ion injector

Info

Publication number
JPS5434776A
JPS5434776A JP10206277A JP10206277A JPS5434776A JP S5434776 A JPS5434776 A JP S5434776A JP 10206277 A JP10206277 A JP 10206277A JP 10206277 A JP10206277 A JP 10206277A JP S5434776 A JPS5434776 A JP S5434776A
Authority
JP
Japan
Prior art keywords
handling method
wafer handling
ion injector
ion injection
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10206277A
Other languages
Japanese (ja)
Inventor
Yukihisa Taguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP10206277A priority Critical patent/JPS5434776A/en
Publication of JPS5434776A publication Critical patent/JPS5434776A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To eliminate the influence of a poisonous gas upon operators by isolating a series of operations of ion injection into semiconductor wafers from the atmosphere of an ion injection room completely.
COPYRIGHT: (C)1979,JPO&Japio
JP10206277A 1977-08-24 1977-08-24 Wafer handling method of ion injector Pending JPS5434776A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10206277A JPS5434776A (en) 1977-08-24 1977-08-24 Wafer handling method of ion injector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10206277A JPS5434776A (en) 1977-08-24 1977-08-24 Wafer handling method of ion injector

Publications (1)

Publication Number Publication Date
JPS5434776A true JPS5434776A (en) 1979-03-14

Family

ID=14317271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10206277A Pending JPS5434776A (en) 1977-08-24 1977-08-24 Wafer handling method of ion injector

Country Status (1)

Country Link
JP (1) JPS5434776A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56116617A (en) * 1980-02-20 1981-09-12 Hitachi Ltd Ion implantation
JPS58146346U (en) * 1982-03-26 1983-10-01 日本電子株式会社 Sample exchange equipment for scanning electron microscopes, etc.
JPS62292646A (en) * 1986-06-13 1987-12-19 Ohara Inc Production of glass ceramic product
JPS6310452A (en) * 1986-06-30 1988-01-18 Tokyo Electron Ltd Ion implantation equipment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56116617A (en) * 1980-02-20 1981-09-12 Hitachi Ltd Ion implantation
JPS58146346U (en) * 1982-03-26 1983-10-01 日本電子株式会社 Sample exchange equipment for scanning electron microscopes, etc.
JPS62292646A (en) * 1986-06-13 1987-12-19 Ohara Inc Production of glass ceramic product
JPS6310452A (en) * 1986-06-30 1988-01-18 Tokyo Electron Ltd Ion implantation equipment

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