JPS5434776A - Wafer handling method of ion injector - Google Patents
Wafer handling method of ion injectorInfo
- Publication number
- JPS5434776A JPS5434776A JP10206277A JP10206277A JPS5434776A JP S5434776 A JPS5434776 A JP S5434776A JP 10206277 A JP10206277 A JP 10206277A JP 10206277 A JP10206277 A JP 10206277A JP S5434776 A JPS5434776 A JP S5434776A
- Authority
- JP
- Japan
- Prior art keywords
- handling method
- wafer handling
- ion injector
- ion injection
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To eliminate the influence of a poisonous gas upon operators by isolating a series of operations of ion injection into semiconductor wafers from the atmosphere of an ion injection room completely.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10206277A JPS5434776A (en) | 1977-08-24 | 1977-08-24 | Wafer handling method of ion injector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10206277A JPS5434776A (en) | 1977-08-24 | 1977-08-24 | Wafer handling method of ion injector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5434776A true JPS5434776A (en) | 1979-03-14 |
Family
ID=14317271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10206277A Pending JPS5434776A (en) | 1977-08-24 | 1977-08-24 | Wafer handling method of ion injector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5434776A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56116617A (en) * | 1980-02-20 | 1981-09-12 | Hitachi Ltd | Ion implantation |
JPS58146346U (en) * | 1982-03-26 | 1983-10-01 | 日本電子株式会社 | Sample exchange equipment for scanning electron microscopes, etc. |
JPS62292646A (en) * | 1986-06-13 | 1987-12-19 | Ohara Inc | Production of glass ceramic product |
JPS6310452A (en) * | 1986-06-30 | 1988-01-18 | Tokyo Electron Ltd | Ion implantation equipment |
-
1977
- 1977-08-24 JP JP10206277A patent/JPS5434776A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56116617A (en) * | 1980-02-20 | 1981-09-12 | Hitachi Ltd | Ion implantation |
JPS58146346U (en) * | 1982-03-26 | 1983-10-01 | 日本電子株式会社 | Sample exchange equipment for scanning electron microscopes, etc. |
JPS62292646A (en) * | 1986-06-13 | 1987-12-19 | Ohara Inc | Production of glass ceramic product |
JPS6310452A (en) * | 1986-06-30 | 1988-01-18 | Tokyo Electron Ltd | Ion implantation equipment |
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