JPS5427429A - Production of photo masks - Google Patents

Production of photo masks

Info

Publication number
JPS5427429A
JPS5427429A JP9323577A JP9323577A JPS5427429A JP S5427429 A JPS5427429 A JP S5427429A JP 9323577 A JP9323577 A JP 9323577A JP 9323577 A JP9323577 A JP 9323577A JP S5427429 A JPS5427429 A JP S5427429A
Authority
JP
Japan
Prior art keywords
photo masks
production
etching
readily
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9323577A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6113745B2 (enrdf_load_stackoverflow
Inventor
Masamichi Sato
Itsuo Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP9323577A priority Critical patent/JPS5427429A/ja
Publication of JPS5427429A publication Critical patent/JPS5427429A/ja
Publication of JPS6113745B2 publication Critical patent/JPS6113745B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
JP9323577A 1977-08-03 1977-08-03 Production of photo masks Granted JPS5427429A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9323577A JPS5427429A (en) 1977-08-03 1977-08-03 Production of photo masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9323577A JPS5427429A (en) 1977-08-03 1977-08-03 Production of photo masks

Publications (2)

Publication Number Publication Date
JPS5427429A true JPS5427429A (en) 1979-03-01
JPS6113745B2 JPS6113745B2 (enrdf_load_stackoverflow) 1986-04-15

Family

ID=14076860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9323577A Granted JPS5427429A (en) 1977-08-03 1977-08-03 Production of photo masks

Country Status (1)

Country Link
JP (1) JPS5427429A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6113745B2 (enrdf_load_stackoverflow) 1986-04-15

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