JPS5293274A - Method of manufacturing negative type photomask by way of new lift off process - Google Patents

Method of manufacturing negative type photomask by way of new lift off process

Info

Publication number
JPS5293274A
JPS5293274A JP968276A JP968276A JPS5293274A JP S5293274 A JPS5293274 A JP S5293274A JP 968276 A JP968276 A JP 968276A JP 968276 A JP968276 A JP 968276A JP S5293274 A JPS5293274 A JP S5293274A
Authority
JP
Japan
Prior art keywords
way
negative type
type photomask
manufacturing negative
new lift
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP968276A
Other languages
Japanese (ja)
Inventor
Eiichi Suzuki
Hiroaki Terunuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP968276A priority Critical patent/JPS5293274A/en
Publication of JPS5293274A publication Critical patent/JPS5293274A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP968276A 1976-01-31 1976-01-31 Method of manufacturing negative type photomask by way of new lift off process Pending JPS5293274A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP968276A JPS5293274A (en) 1976-01-31 1976-01-31 Method of manufacturing negative type photomask by way of new lift off process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP968276A JPS5293274A (en) 1976-01-31 1976-01-31 Method of manufacturing negative type photomask by way of new lift off process

Publications (1)

Publication Number Publication Date
JPS5293274A true JPS5293274A (en) 1977-08-05

Family

ID=11726966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP968276A Pending JPS5293274A (en) 1976-01-31 1976-01-31 Method of manufacturing negative type photomask by way of new lift off process

Country Status (1)

Country Link
JP (1) JPS5293274A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55146928A (en) * 1979-05-02 1980-11-15 Ulvac Corp Manufacturing of photomask substrate
JPS61255347A (en) * 1985-05-08 1986-11-13 Toshiba Mach Co Ltd Production of glass mask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55146928A (en) * 1979-05-02 1980-11-15 Ulvac Corp Manufacturing of photomask substrate
JPS6055827B2 (en) * 1979-05-02 1985-12-06 日本真空技術株式会社 Photomask substrate processing method
JPS61255347A (en) * 1985-05-08 1986-11-13 Toshiba Mach Co Ltd Production of glass mask

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