JPS54154967A - Semiconductor electronic device - Google Patents
Semiconductor electronic deviceInfo
- Publication number
- JPS54154967A JPS54154967A JP6341678A JP6341678A JPS54154967A JP S54154967 A JPS54154967 A JP S54154967A JP 6341678 A JP6341678 A JP 6341678A JP 6341678 A JP6341678 A JP 6341678A JP S54154967 A JPS54154967 A JP S54154967A
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- given
- si3b
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 238000010306 acid treatment Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000012212 insulator Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 230000003071 parasitic effect Effects 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
- 238000000992 sputter etching Methods 0.000 abstract 1
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6341678A JPS54154967A (en) | 1978-05-29 | 1978-05-29 | Semiconductor electronic device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6341678A JPS54154967A (en) | 1978-05-29 | 1978-05-29 | Semiconductor electronic device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54154967A true JPS54154967A (en) | 1979-12-06 |
JPS6237539B2 JPS6237539B2 (enrdf_load_stackoverflow) | 1987-08-13 |
Family
ID=13228654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6341678A Granted JPS54154967A (en) | 1978-05-29 | 1978-05-29 | Semiconductor electronic device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54154967A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5852851A (ja) * | 1981-09-24 | 1983-03-29 | Nec Corp | 半導体装置の製造方法 |
JPS625657A (ja) * | 1985-07-01 | 1987-01-12 | Nec Corp | 半導体集積回路装置 |
JPS63143867A (ja) * | 1986-12-08 | 1988-06-16 | Mitsubishi Electric Corp | 半導体集積回路装置 |
US5196357A (en) * | 1991-11-18 | 1993-03-23 | Vlsi Technology, Inc. | Method of making extended polysilicon self-aligned gate overlapped lightly doped drain structure for submicron transistor |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63172098U (enrdf_load_stackoverflow) * | 1987-04-30 | 1988-11-09 | ||
JPH01161131U (enrdf_load_stackoverflow) * | 1988-04-30 | 1989-11-09 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5011676A (enrdf_load_stackoverflow) * | 1973-06-01 | 1975-02-06 | ||
JPS5091288A (enrdf_load_stackoverflow) * | 1973-12-12 | 1975-07-21 |
-
1978
- 1978-05-29 JP JP6341678A patent/JPS54154967A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5011676A (enrdf_load_stackoverflow) * | 1973-06-01 | 1975-02-06 | ||
JPS5091288A (enrdf_load_stackoverflow) * | 1973-12-12 | 1975-07-21 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5852851A (ja) * | 1981-09-24 | 1983-03-29 | Nec Corp | 半導体装置の製造方法 |
JPS625657A (ja) * | 1985-07-01 | 1987-01-12 | Nec Corp | 半導体集積回路装置 |
JPS63143867A (ja) * | 1986-12-08 | 1988-06-16 | Mitsubishi Electric Corp | 半導体集積回路装置 |
US5196357A (en) * | 1991-11-18 | 1993-03-23 | Vlsi Technology, Inc. | Method of making extended polysilicon self-aligned gate overlapped lightly doped drain structure for submicron transistor |
Also Published As
Publication number | Publication date |
---|---|
JPS6237539B2 (enrdf_load_stackoverflow) | 1987-08-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5693341A (en) | Manufacture of bipolar ic | |
JPS55138267A (en) | Manufacture of semiconductor integrated circuit containing resistance element | |
JPS5467778A (en) | Production of semiconductor device | |
JPS57159055A (en) | Manufacture of semiconductor device | |
HK69587A (en) | Semiconductor integrated circuit devices and method of manufacturing the same | |
JPS54154967A (en) | Semiconductor electronic device | |
JPS5740975A (en) | Manufacture for semiconductor device | |
JPS5737870A (en) | Semiconductor device | |
JPS54154966A (en) | Semiconductor electron device | |
JPS55157241A (en) | Manufacture of semiconductor device | |
JPS5456357A (en) | Production of semiconductor device | |
JPS57149774A (en) | Semiconductor device | |
JPS5759378A (en) | Manufacture of semiconductor device | |
JPS6129538B2 (enrdf_load_stackoverflow) | ||
JPS5492074A (en) | Mis field effect transistor and its manufacture | |
JPS6468948A (en) | Manufacture of semiconductor device | |
JPS56129342A (en) | Semiconductor integrated circuit device | |
JPS5477578A (en) | High frequency high output bipolar transistor | |
JPS54143076A (en) | Semiconductor device and its manufacture | |
JPS55120170A (en) | Mos type semiconductor device | |
JPS57162460A (en) | Manufacture of semiconductor device | |
JPS56157043A (en) | Manufacture of semiconductor device | |
JPS5728352A (en) | Semiconductor integrated circuit and manufacture thereof | |
JPS5586172A (en) | Manufacture of semiconductor pickup device | |
JPS5477570A (en) | Production of semiconductor element |