JPS54146580A - Thin plate flattening correction mechanism - Google Patents
Thin plate flattening correction mechanismInfo
- Publication number
- JPS54146580A JPS54146580A JP5469878A JP5469878A JPS54146580A JP S54146580 A JPS54146580 A JP S54146580A JP 5469878 A JP5469878 A JP 5469878A JP 5469878 A JP5469878 A JP 5469878A JP S54146580 A JPS54146580 A JP S54146580A
- Authority
- JP
- Japan
- Prior art keywords
- warp
- cylindrical component
- thin plate
- mask
- correction mechanism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To secure a flat adsorption of the thin plate onto the surfaces of the cylindrical component and the electrostrictive element by providing the electrostrictive element to the hollow part of the cylindrical component.
CONSTITUTION: Mask 17 featuring the concave warp is put onto the holder composed of cylindrical component 11 and electrostrictive element 13. Then the mask and the holder are adsorbed by absorption 16 and via hole 14 and groove 15. Accordingly, element 13 warps downward according to the warp of the mask. A fixed amount voltage is applied to element 13 to warp the element and thus to secure the same level for the upper surface of the element as end face 11a of the cylindrical component. In this way, even the slight warp can be corrected.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5469878A JPS54146580A (en) | 1978-05-09 | 1978-05-09 | Thin plate flattening correction mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5469878A JPS54146580A (en) | 1978-05-09 | 1978-05-09 | Thin plate flattening correction mechanism |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54146580A true JPS54146580A (en) | 1979-11-15 |
JPS576689B2 JPS576689B2 (en) | 1982-02-06 |
Family
ID=12978016
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5469878A Granted JPS54146580A (en) | 1978-05-09 | 1978-05-09 | Thin plate flattening correction mechanism |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54146580A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5734336A (en) * | 1980-08-11 | 1982-02-24 | Hitachi Ltd | Exposure device |
JPS5772323A (en) * | 1980-10-23 | 1982-05-06 | Hitachi Ltd | Thin plate flattening equipment |
JPS5815237A (en) * | 1981-07-21 | 1983-01-28 | Seiko Epson Corp | Apparatus for manufacturing semiconductor |
JPH0982606A (en) * | 1995-09-13 | 1997-03-28 | Nikon Corp | Reticle holder |
JP2003100619A (en) * | 2001-09-27 | 2003-04-04 | Nikon Corp | Mask holding apparatus and method, and exposing apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4888871A (en) * | 1972-02-02 | 1973-11-21 |
-
1978
- 1978-05-09 JP JP5469878A patent/JPS54146580A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4888871A (en) * | 1972-02-02 | 1973-11-21 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5734336A (en) * | 1980-08-11 | 1982-02-24 | Hitachi Ltd | Exposure device |
JPH0145217B2 (en) * | 1980-08-11 | 1989-10-03 | Hitachi Ltd | |
JPS5772323A (en) * | 1980-10-23 | 1982-05-06 | Hitachi Ltd | Thin plate flattening equipment |
JPS5815237A (en) * | 1981-07-21 | 1983-01-28 | Seiko Epson Corp | Apparatus for manufacturing semiconductor |
JPH0982606A (en) * | 1995-09-13 | 1997-03-28 | Nikon Corp | Reticle holder |
JP2003100619A (en) * | 2001-09-27 | 2003-04-04 | Nikon Corp | Mask holding apparatus and method, and exposing apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS576689B2 (en) | 1982-02-06 |
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