JPS54136274A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS54136274A JPS54136274A JP4385378A JP4385378A JPS54136274A JP S54136274 A JPS54136274 A JP S54136274A JP 4385378 A JP4385378 A JP 4385378A JP 4385378 A JP4385378 A JP 4385378A JP S54136274 A JPS54136274 A JP S54136274A
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- oxygen
- taken
- oxygen concentration
- cyochralshi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4385378A JPS54136274A (en) | 1978-04-14 | 1978-04-14 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4385378A JPS54136274A (en) | 1978-04-14 | 1978-04-14 | Semiconductor device |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3784486A Division JPS61198638A (ja) | 1986-02-22 | 1986-02-22 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54136274A true JPS54136274A (en) | 1979-10-23 |
| JPS6142855B2 JPS6142855B2 (cs) | 1986-09-24 |
Family
ID=12675261
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4385378A Granted JPS54136274A (en) | 1978-04-14 | 1978-04-14 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54136274A (cs) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS575364A (en) * | 1980-06-13 | 1982-01-12 | Nec Kyushu Ltd | Mos integrated circuit device |
| JPS5935488A (ja) * | 1982-08-24 | 1984-02-27 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
| US6028264A (en) * | 1982-08-24 | 2000-02-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor having low concentration of carbon |
| US6180991B1 (en) | 1982-12-23 | 2001-01-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor having low concentration of phosphorous |
| USRE37441E1 (en) | 1982-08-24 | 2001-11-13 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device |
| US6346716B1 (en) * | 1982-12-23 | 2002-02-12 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material having particular oxygen concentration and semiconductor device comprising the same |
| US6664566B1 (en) | 1982-08-24 | 2003-12-16 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method of making the same |
| USRE38727E1 (en) | 1982-08-24 | 2005-04-19 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method of making the same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02138443U (cs) * | 1989-04-20 | 1990-11-19 |
-
1978
- 1978-04-14 JP JP4385378A patent/JPS54136274A/ja active Granted
Non-Patent Citations (6)
| Title |
|---|
| APPLIED PHYSICS LETTERS=1977 * |
| APPLIED PHYSICS LETTERS=1977M2 * |
| APPLIED PHYSICS LETTERS=1977M7D15 * |
| JOURNAL OF APPLIED PHYSICS=1975M5 * |
| SOLID STATE SCIENCE AND TECHNOLOGY=1975M12 * |
| SOLID-STATE SCIENCE AND TECHNOLOGY=1976M12 * |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS575364A (en) * | 1980-06-13 | 1982-01-12 | Nec Kyushu Ltd | Mos integrated circuit device |
| JPS5935488A (ja) * | 1982-08-24 | 1984-02-27 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
| US6028264A (en) * | 1982-08-24 | 2000-02-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor having low concentration of carbon |
| USRE37441E1 (en) | 1982-08-24 | 2001-11-13 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device |
| US6664566B1 (en) | 1982-08-24 | 2003-12-16 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method of making the same |
| USRE38727E1 (en) | 1982-08-24 | 2005-04-19 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method of making the same |
| US6180991B1 (en) | 1982-12-23 | 2001-01-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor having low concentration of phosphorous |
| US6346716B1 (en) * | 1982-12-23 | 2002-02-12 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material having particular oxygen concentration and semiconductor device comprising the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6142855B2 (cs) | 1986-09-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5596641A (en) | Method of fabricating silicon monocrystal wafer | |
| JPS54136274A (en) | Semiconductor device | |
| JPS5787119A (en) | Manufacture of semiconductor device | |
| JPS5423386A (en) | Manufacture of semiconductor device | |
| JPS51142975A (en) | Production method of semiconductor devices | |
| JPS5459090A (en) | Semiconductor device and its manufacture | |
| DK0866508T3 (da) | Fremgangsmåde til fremstilling af superledere af sjældne jordarter-barium-cuprater | |
| JPS5533020A (en) | Manufacture of semiconductor device | |
| JPS558036A (en) | Electrode formation | |
| JPS5269571A (en) | Thermal oxidation method for semiconductor wafer | |
| JPS5436192A (en) | Manufacture for semiconductor | |
| JPS5370761A (en) | Production of semiconductor device | |
| JPS54103670A (en) | Impurity diffusion method of semiconductor single crystal | |
| JPS5247370A (en) | Diffusion method | |
| JPS54153569A (en) | Heat treatment method for semiconductor wafer | |
| JPS5555524A (en) | Method of manufacturing semiconductor device | |
| JPS5326281A (en) | Gas phase crystal growth method | |
| JPS5740939A (en) | P-n junction formation | |
| JPS5210681A (en) | Method for treating surface of semiconductor substrate | |
| JPS54125966A (en) | Defect elimination method for semiconductor wafer | |
| JPS5317065A (en) | Liquid phase growth method for semiconductor substrate | |
| JPS53143184A (en) | Production of semiconductor integrated circuit | |
| JPS51117878A (en) | Manufacturing method of semiconductor device | |
| JPS51145277A (en) | Manufacture of silicon crystal substratum | |
| JPS5223265A (en) | Method of processing semiconductor materials |