JPS54129979A - Electron-beam exposing method - Google Patents

Electron-beam exposing method

Info

Publication number
JPS54129979A
JPS54129979A JP3788578A JP3788578A JPS54129979A JP S54129979 A JPS54129979 A JP S54129979A JP 3788578 A JP3788578 A JP 3788578A JP 3788578 A JP3788578 A JP 3788578A JP S54129979 A JPS54129979 A JP S54129979A
Authority
JP
Japan
Prior art keywords
information
work
signal
work information
memory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3788578A
Other languages
Japanese (ja)
Inventor
Hitoshi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP3788578A priority Critical patent/JPS54129979A/en
Publication of JPS54129979A publication Critical patent/JPS54129979A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To shorten a work time by continuing work by work information transferred at the prior stage while work information is transferred from an electronic computer. CONSTITUTION:By the indication of decoder 3, pieces of work information are stored in memories 21 to 2n from electronic computer 1, and by the signal of memory 2n, FF4 shows the transfer-end set state. During this, the irradiation of the prior transfer information ends and FF5 is set by receiving an end signal from exposure controller 6. When the signals of both FFs agree 7, an instruction is sent out 8 to read work information stored in memory unit 2 to memory 9 in parallel and an exposure command is transmitted to controller 6 to supply a signal, which bases upon the information, to screening electrode 9 and deflector 10. Since the electric computer is requested 8 to send information at the same time as reception 8 of coincidence signal 7, the electric computer commands a decoder to read the next work information into memory unit 2.
JP3788578A 1978-03-31 1978-03-31 Electron-beam exposing method Pending JPS54129979A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3788578A JPS54129979A (en) 1978-03-31 1978-03-31 Electron-beam exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3788578A JPS54129979A (en) 1978-03-31 1978-03-31 Electron-beam exposing method

Publications (1)

Publication Number Publication Date
JPS54129979A true JPS54129979A (en) 1979-10-08

Family

ID=12509988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3788578A Pending JPS54129979A (en) 1978-03-31 1978-03-31 Electron-beam exposing method

Country Status (1)

Country Link
JP (1) JPS54129979A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5577136A (en) * 1978-12-06 1980-06-10 Fujitsu Ltd Electron beam exposure control system
JPS5615043A (en) * 1979-07-18 1981-02-13 Fujitsu Ltd Electron beam exposure system
JPS58147116A (en) * 1982-02-26 1983-09-01 Toshiba Mach Co Ltd Image drawing device using electron beam

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5577136A (en) * 1978-12-06 1980-06-10 Fujitsu Ltd Electron beam exposure control system
JPS5622366B2 (en) * 1978-12-06 1981-05-25
JPS5615043A (en) * 1979-07-18 1981-02-13 Fujitsu Ltd Electron beam exposure system
JPS58147116A (en) * 1982-02-26 1983-09-01 Toshiba Mach Co Ltd Image drawing device using electron beam

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