JPS5512723A - Electronic beam exposing method and device - Google Patents

Electronic beam exposing method and device

Info

Publication number
JPS5512723A
JPS5512723A JP8478178A JP8478178A JPS5512723A JP S5512723 A JPS5512723 A JP S5512723A JP 8478178 A JP8478178 A JP 8478178A JP 8478178 A JP8478178 A JP 8478178A JP S5512723 A JPS5512723 A JP S5512723A
Authority
JP
Japan
Prior art keywords
field
hsc
electronic beam
data
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8478178A
Other languages
Japanese (ja)
Inventor
Makoto Takeuchi
Itsuo Yamamoto
Kazumitsu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP8478178A priority Critical patent/JPS5512723A/en
Publication of JPS5512723A publication Critical patent/JPS5512723A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To reduce the frequency of data transmission by forming into a group a line or row of a field in a chip equally divided within a range lacking in distortion; and by letting the exposing process move to the next after it has been completed to expose the fields in the same line or row in all the chips. CONSTITUTION:Based on the command of a high-speed data transmission control mechanism (HSC) 5, the same amount of data as that of a line of a field within a chip A is transmitted to a memory 6 from a disc 2 through a direct memory access controller 4, and stored in it. The HSC 5, while reading out the data and converting them into exposure signals, supplies to the second deflecting device 11 a signal specifying the position for applying an electronic beam in a sub-field via a D-A converter 10; and to the first deflecting device 9 a signal specifying the position for applying an electronic beam in a field through a D-A converter 8. After the sub-field is exposed, the data carrier is moved by the HSC 5.
JP8478178A 1978-07-12 1978-07-12 Electronic beam exposing method and device Pending JPS5512723A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8478178A JPS5512723A (en) 1978-07-12 1978-07-12 Electronic beam exposing method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8478178A JPS5512723A (en) 1978-07-12 1978-07-12 Electronic beam exposing method and device

Publications (1)

Publication Number Publication Date
JPS5512723A true JPS5512723A (en) 1980-01-29

Family

ID=13840226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8478178A Pending JPS5512723A (en) 1978-07-12 1978-07-12 Electronic beam exposing method and device

Country Status (1)

Country Link
JP (1) JPS5512723A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204127A (en) * 1981-06-10 1982-12-14 Hitachi Ltd Drawing method for pattern of electron-ray drawing device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204127A (en) * 1981-06-10 1982-12-14 Hitachi Ltd Drawing method for pattern of electron-ray drawing device

Similar Documents

Publication Publication Date Title
DE3363539D1 (en) Method of growing an alloy film by a layer-by-layer process on a substrate, and a method of making a semiconductor device
DE3072031D1 (en) Process for producing a solder connection between a semiconductor device and a carrier substrate, and a semiconductor device made by such method
JPS5511303A (en) Electron-beam exposure device
JPS5247636A (en) Control method for transmitting information
JPS5577144A (en) Electron beam exposure method
JPS5512723A (en) Electronic beam exposing method and device
EP0265913A3 (en) Semi-custom-made integrated circuit device
JPS5527689A (en) Electro beam exposing method
JPS533034A (en) Channel hysteresis recording system
JPS5599724A (en) Method of exposing electron beam
JPS5213740A (en) Information transmission system
JPS54129979A (en) Electron-beam exposing method
JPS52130570A (en) Electron beam exposing device
JPS56104439A (en) Electron beam exposing method
JPS56135929A (en) Electron-beam drawing device
JPS5521155A (en) Electronic beam exposing system
JPS5245907A (en) Automatic optical path adjusting device
JPS5250215A (en) Driving device for magnetic disc
JPS57105061A (en) Advanced seek control system of floppy disk device
JPS5622107A (en) Playback type nc machine tool
JPS5448124A (en) Plotter system incorporating random access memory devcice
JPS5271138A (en) Multiple stage memory device
JPS5462499A (en) Irradiation quantity controlling method of radiation ray
JPS5785229A (en) Casette holding device for electron beam exposure
JPS57197739A (en) Stroboscanning electron microscope