JPS54109896A - Background quantity assessing apparatus in x-ray microanalyzer or the like - Google Patents
Background quantity assessing apparatus in x-ray microanalyzer or the likeInfo
- Publication number
- JPS54109896A JPS54109896A JP1676878A JP1676878A JPS54109896A JP S54109896 A JPS54109896 A JP S54109896A JP 1676878 A JP1676878 A JP 1676878A JP 1676878 A JP1676878 A JP 1676878A JP S54109896 A JPS54109896 A JP S54109896A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- intensity
- specimen
- ray intensity
- continuous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 abstract 3
- 238000001514 detection method Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 230000003595 spectral effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1676878A JPS54109896A (en) | 1978-02-16 | 1978-02-16 | Background quantity assessing apparatus in x-ray microanalyzer or the like |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1676878A JPS54109896A (en) | 1978-02-16 | 1978-02-16 | Background quantity assessing apparatus in x-ray microanalyzer or the like |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54109896A true JPS54109896A (en) | 1979-08-28 |
JPS6235055B2 JPS6235055B2 (enrdf_load_stackoverflow) | 1987-07-30 |
Family
ID=11925389
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1676878A Granted JPS54109896A (en) | 1978-02-16 | 1978-02-16 | Background quantity assessing apparatus in x-ray microanalyzer or the like |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54109896A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008122267A (ja) * | 2006-11-14 | 2008-05-29 | Jeol Ltd | 試料分析方法及び試料分析装置 |
CN108717065A (zh) * | 2018-04-16 | 2018-10-30 | 中国地质大学(武汉) | 一种利用多点拟合确定连续x射线背景强度的方法 |
-
1978
- 1978-02-16 JP JP1676878A patent/JPS54109896A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008122267A (ja) * | 2006-11-14 | 2008-05-29 | Jeol Ltd | 試料分析方法及び試料分析装置 |
CN108717065A (zh) * | 2018-04-16 | 2018-10-30 | 中国地质大学(武汉) | 一种利用多点拟合确定连续x射线背景强度的方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6235055B2 (enrdf_load_stackoverflow) | 1987-07-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5756740A (en) | Object inspecting device | |
JPS5949524B2 (ja) | 測定システム | |
US4129778A (en) | Method and apparatus for measuring the thickness of a non-metallic coating on a plated metal plate | |
US4016419A (en) | Non-dispersive X-ray fluorescence analyzer | |
JPS54109896A (en) | Background quantity assessing apparatus in x-ray microanalyzer or the like | |
JPS5759143A (en) | Measuring method for grain size of granular material | |
JPS5582006A (en) | Measuring method for thickness | |
JPS52127292A (en) | Analyzer | |
US3253149A (en) | Method and apparatus for hardness testing using backscattered beta radiation | |
JPS54118861A (en) | Plate thickness measuring method | |
RU2234677C2 (ru) | Рентгеновский способ измерения толщины листовых изделий | |
SU1082119A1 (ru) | Способ контрол изделий методом вычислительной томографии | |
JPS5796207A (en) | Measuring apparatus for pattern dimensions | |
JPS5529726A (en) | Water content measuring method dependent upon infrared ray | |
JPS54109897A (en) | Specimen analytical apparatus in scanning electron microscope or the like | |
SU1004831A1 (ru) | Нейтронный влагомер | |
JPS6453144A (en) | Method for evaluating thin film by fluorescent x-ray analysis | |
JPS6445047A (en) | Measuring device for cathode luminesence | |
JPS55159143A (en) | Metal surface flaw detector | |
CA2125578A1 (en) | Sensor and method for measurement of select components of a material | |
JP2937598B2 (ja) | 深さ方向元素濃度分布測定装置 | |
SU616573A1 (ru) | Устройство дл магнитошумовой структуроскопии | |
SU1046663A1 (ru) | Анализатор состава веществ | |
JPS5624564A (en) | Determination method of and apparatus for hydrogen in metal | |
JPS56153231A (en) | Stress measuring method |