JPS6453144A - Method for evaluating thin film by fluorescent x-ray analysis - Google Patents

Abstract

PURPOSE:To exactly detect the max. value even if a measurement error, etc., exist so that the thin film to be measured can be exactly evaluated by measuring intensities at every slight angle deviated near a predicted set angle and detecting the max. value of fluorescent X-ray intensities. CONSTITUTION:The fluorescent X-rays having the wavelengths intrinsic to elements obtd. by projecting primary X-rays from an X-ray tube 10 to a measurement wafer 12 in a vacuum are guided to a spectral crystal 16 installed to a goniometer 22 rotating at a driving unit 36 while the angle is measured by an angle control unit 40. This X-ray is diffracted at the angles different with each of the wavelengths by which the qualitative analysis to determine the elements contained in the sample is executed. Since the contents of the elements are proportional to the intensities of the generated fluorescent X-rays, the intensities are measured by a detector 20, an amplifier 24, etc., by which the quantitative analysis is executed. There is a need for detecting the max. value of the fluorescent X-ray intensities from the desired elements and the purpose is attained by measuring the intensities while the angle of the goniometer 22 is successively changed at slight angles.