JPS5399769A - Formation of insulating film onto semiconductor substrate - Google Patents

Formation of insulating film onto semiconductor substrate

Info

Publication number
JPS5399769A
JPS5399769A JP1447877A JP1447877A JPS5399769A JP S5399769 A JPS5399769 A JP S5399769A JP 1447877 A JP1447877 A JP 1447877A JP 1447877 A JP1447877 A JP 1447877A JP S5399769 A JPS5399769 A JP S5399769A
Authority
JP
Japan
Prior art keywords
formation
insulating film
semiconductor substrate
film onto
onto semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1447877A
Other languages
Japanese (ja)
Other versions
JPS5625778B2 (en
Inventor
Yoshitaka Furukawa
Goji Kawakami
Ganzou Iwane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP1447877A priority Critical patent/JPS5399769A/en
Publication of JPS5399769A publication Critical patent/JPS5399769A/en
Publication of JPS5625778B2 publication Critical patent/JPS5625778B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE: To form can insulating glass film while keeping the GaAs surface stable, by depositing the material of vapor-phased Vb-or VIb-group while cleansing the substrate surface with vapor-pahsed VIIb-group material.
COPYRIGHT: (C)1978,JPO&Japio
JP1447877A 1977-02-12 1977-02-12 Formation of insulating film onto semiconductor substrate Granted JPS5399769A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1447877A JPS5399769A (en) 1977-02-12 1977-02-12 Formation of insulating film onto semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1447877A JPS5399769A (en) 1977-02-12 1977-02-12 Formation of insulating film onto semiconductor substrate

Publications (2)

Publication Number Publication Date
JPS5399769A true JPS5399769A (en) 1978-08-31
JPS5625778B2 JPS5625778B2 (en) 1981-06-15

Family

ID=11862158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1447877A Granted JPS5399769A (en) 1977-02-12 1977-02-12 Formation of insulating film onto semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS5399769A (en)

Also Published As

Publication number Publication date
JPS5625778B2 (en) 1981-06-15

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