JPS5393784A - Transfer mask for x-ray exposure and its production - Google Patents
Transfer mask for x-ray exposure and its productionInfo
- Publication number
- JPS5393784A JPS5393784A JP853677A JP853677A JPS5393784A JP S5393784 A JPS5393784 A JP S5393784A JP 853677 A JP853677 A JP 853677A JP 853677 A JP853677 A JP 853677A JP S5393784 A JPS5393784 A JP S5393784A
- Authority
- JP
- Japan
- Prior art keywords
- production
- ray exposure
- transfer mask
- transfer patterns
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To reduce physical damages, attenuate secondary electrons at the time of exposure and obtain fine transfer patterns by coating a high molecular resin layer which causes curing and change of properties when radiated with ions, after forming an X-ray absorption layer having desired transfer patterns on the X-ray transmission layer.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP853677A JPS5393784A (en) | 1977-01-27 | 1977-01-27 | Transfer mask for x-ray exposure and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP853677A JPS5393784A (en) | 1977-01-27 | 1977-01-27 | Transfer mask for x-ray exposure and its production |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5393784A true JPS5393784A (en) | 1978-08-17 |
JPS6210013B2 JPS6210013B2 (en) | 1987-03-04 |
Family
ID=11695862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP853677A Granted JPS5393784A (en) | 1977-01-27 | 1977-01-27 | Transfer mask for x-ray exposure and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5393784A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017173810A (en) * | 2016-03-16 | 2017-09-28 | 大日本印刷株式会社 | Mask for charge particle beam exposure and manufacturing method therefor |
-
1977
- 1977-01-27 JP JP853677A patent/JPS5393784A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017173810A (en) * | 2016-03-16 | 2017-09-28 | 大日本印刷株式会社 | Mask for charge particle beam exposure and manufacturing method therefor |
Also Published As
Publication number | Publication date |
---|---|
JPS6210013B2 (en) | 1987-03-04 |
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