JPS5382174A - Surface processing method for semiconductor device - Google Patents

Surface processing method for semiconductor device

Info

Publication number
JPS5382174A
JPS5382174A JP15883076A JP15883076A JPS5382174A JP S5382174 A JPS5382174 A JP S5382174A JP 15883076 A JP15883076 A JP 15883076A JP 15883076 A JP15883076 A JP 15883076A JP S5382174 A JPS5382174 A JP S5382174A
Authority
JP
Japan
Prior art keywords
semiconductor device
processing method
surface processing
etching
residual
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15883076A
Other languages
English (en)
Japanese (ja)
Other versions
JPS576693B2 (enrdf_load_stackoverflow
Inventor
Misao Saga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP15883076A priority Critical patent/JPS5382174A/ja
Publication of JPS5382174A publication Critical patent/JPS5382174A/ja
Publication of JPS576693B2 publication Critical patent/JPS576693B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
JP15883076A 1976-12-27 1976-12-27 Surface processing method for semiconductor device Granted JPS5382174A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15883076A JPS5382174A (en) 1976-12-27 1976-12-27 Surface processing method for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15883076A JPS5382174A (en) 1976-12-27 1976-12-27 Surface processing method for semiconductor device

Publications (2)

Publication Number Publication Date
JPS5382174A true JPS5382174A (en) 1978-07-20
JPS576693B2 JPS576693B2 (enrdf_load_stackoverflow) 1982-02-06

Family

ID=15680310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15883076A Granted JPS5382174A (en) 1976-12-27 1976-12-27 Surface processing method for semiconductor device

Country Status (1)

Country Link
JP (1) JPS5382174A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS586621A (ja) * 1981-07-03 1983-01-14 Mitsubishi Electric Corp 誤動作防止回路

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55113444U (enrdf_load_stackoverflow) * 1979-02-05 1980-08-09

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS586621A (ja) * 1981-07-03 1983-01-14 Mitsubishi Electric Corp 誤動作防止回路

Also Published As

Publication number Publication date
JPS576693B2 (enrdf_load_stackoverflow) 1982-02-06

Similar Documents

Publication Publication Date Title
JPS5244173A (en) Method of flat etching of silicon substrate
JPS5351970A (en) Manufacture for semiconductor substrate
JPS5382174A (en) Surface processing method for semiconductor device
JPS5244175A (en) Method of flat etching of silicon substrate
JPS5437468A (en) Breaking device for semiconductor wafer
JPS543473A (en) Manufacture of semiconductor device
JPS5339872A (en) Etching method of wafers
JPS5368070A (en) Etching method
JPS5252566A (en) Production of semiconductor element
JPS546793A (en) Photo detector of semiconductor
JPS5243369A (en) Flat etching method for silicon
JPS53142168A (en) Reproductive use of semiconductor substrate
JPS5411688A (en) Manufacture for semiconductor device
JPS5249771A (en) Process for production of semiconductor device
JPS52155972A (en) Production of semiconductor device
JPS5355960A (en) Breaking method for semiconductor wafer
JPS5389655A (en) Production of semiconductor device
JPS5417663A (en) Manufacture of semiconductor device
JPS52155054A (en) Production of semiconductor device
JPS5428580A (en) Manufacture of semiconductor device
JPS51140484A (en) Method of etching wafer
JPS54875A (en) Gettering process system for semiconductor substrate
JPS52109368A (en) Semiconductor device
JPS5210070A (en) Method for manufacturing silicon semiconductor device
JPS5315760A (en) Production of semiconductor device