JPS5380158A - Vapor phase growth for compound semiconductor - Google Patents

Vapor phase growth for compound semiconductor

Info

Publication number
JPS5380158A
JPS5380158A JP15676776A JP15676776A JPS5380158A JP S5380158 A JPS5380158 A JP S5380158A JP 15676776 A JP15676776 A JP 15676776A JP 15676776 A JP15676776 A JP 15676776A JP S5380158 A JPS5380158 A JP S5380158A
Authority
JP
Japan
Prior art keywords
compound semiconductor
vapor phase
phase growth
gas
substrate toward
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15676776A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5514529B2 (cs
Inventor
Akira Miura
Masahiko Kawano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15676776A priority Critical patent/JPS5380158A/ja
Publication of JPS5380158A publication Critical patent/JPS5380158A/ja
Publication of JPS5514529B2 publication Critical patent/JPS5514529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP15676776A 1976-12-25 1976-12-25 Vapor phase growth for compound semiconductor Granted JPS5380158A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15676776A JPS5380158A (en) 1976-12-25 1976-12-25 Vapor phase growth for compound semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15676776A JPS5380158A (en) 1976-12-25 1976-12-25 Vapor phase growth for compound semiconductor

Publications (2)

Publication Number Publication Date
JPS5380158A true JPS5380158A (en) 1978-07-15
JPS5514529B2 JPS5514529B2 (cs) 1980-04-17

Family

ID=15634856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15676776A Granted JPS5380158A (en) 1976-12-25 1976-12-25 Vapor phase growth for compound semiconductor

Country Status (1)

Country Link
JP (1) JPS5380158A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037860U (ja) * 1983-08-22 1985-03-15 松下電器産業株式会社 ガスセンサ
JPS61748A (ja) * 1984-06-14 1986-01-06 Mitsubishi Electric Corp 悪臭ガス濃度計測装置

Also Published As

Publication number Publication date
JPS5514529B2 (cs) 1980-04-17

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