JPS5375774A - Exposure unit - Google Patents
Exposure unitInfo
- Publication number
- JPS5375774A JPS5375774A JP15161576A JP15161576A JPS5375774A JP S5375774 A JPS5375774 A JP S5375774A JP 15161576 A JP15161576 A JP 15161576A JP 15161576 A JP15161576 A JP 15161576A JP S5375774 A JPS5375774 A JP S5375774A
- Authority
- JP
- Japan
- Prior art keywords
- exposure unit
- positioning
- mask
- enable
- even under
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To enable the positioning between the mask and the object even under exposing work by means of intermittent flashing, in the exposure unit providing the positioning section using the oscillating slit method.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15161576A JPS5375774A (en) | 1976-12-16 | 1976-12-16 | Exposure unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15161576A JPS5375774A (en) | 1976-12-16 | 1976-12-16 | Exposure unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5375774A true JPS5375774A (en) | 1978-07-05 |
JPS563663B2 JPS563663B2 (en) | 1981-01-26 |
Family
ID=15522399
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15161576A Granted JPS5375774A (en) | 1976-12-16 | 1976-12-16 | Exposure unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5375774A (en) |
-
1976
- 1976-12-16 JP JP15161576A patent/JPS5375774A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS563663B2 (en) | 1981-01-26 |
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