JPS5365276A - Rotary chemical evaporation apparatus for forming thin film - Google Patents

Rotary chemical evaporation apparatus for forming thin film

Info

Publication number
JPS5365276A
JPS5365276A JP14067076A JP14067076A JPS5365276A JP S5365276 A JPS5365276 A JP S5365276A JP 14067076 A JP14067076 A JP 14067076A JP 14067076 A JP14067076 A JP 14067076A JP S5365276 A JPS5365276 A JP S5365276A
Authority
JP
Japan
Prior art keywords
thin film
evaporation apparatus
forming thin
chemical evaporation
rotary chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14067076A
Other languages
Japanese (ja)
Inventor
Teruo Yoneyama
Yasuo Iizuka
Shinichi Yamamoto
Mitsusada Shibasaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14067076A priority Critical patent/JPS5365276A/en
Publication of JPS5365276A publication Critical patent/JPS5365276A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide an apparatus described in the title for forming multilayer thin film by detecting thin film thickness formed in the former step on a substratum surface placed on a swiveling table, by stopping the film formation when the thickness reached the set value, and by starting the latter formation of thin film.
JP14067076A 1976-11-25 1976-11-25 Rotary chemical evaporation apparatus for forming thin film Pending JPS5365276A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14067076A JPS5365276A (en) 1976-11-25 1976-11-25 Rotary chemical evaporation apparatus for forming thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14067076A JPS5365276A (en) 1976-11-25 1976-11-25 Rotary chemical evaporation apparatus for forming thin film

Publications (1)

Publication Number Publication Date
JPS5365276A true JPS5365276A (en) 1978-06-10

Family

ID=15274019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14067076A Pending JPS5365276A (en) 1976-11-25 1976-11-25 Rotary chemical evaporation apparatus for forming thin film

Country Status (1)

Country Link
JP (1) JPS5365276A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5665974A (en) * 1979-11-02 1981-06-04 Komatsu Ltd Vapor deposition controlling method
JPS58140605A (en) * 1982-01-18 1983-08-20 Koshin Kogaku:Kk Controlling method of thickness of optical thin film
JPS62165103A (en) * 1986-01-17 1987-07-21 Canon Inc Method for measuring film thickness
EP0233610A2 (en) * 1986-02-15 1987-08-26 Sony Corporation Method and apparatus for vapor deposition
US4878755A (en) * 1986-03-29 1989-11-07 Leybold Aktiengesellschaft Process and device for measuring the optical properties of thin layers
JPH0443906A (en) * 1990-06-11 1992-02-13 Matsushita Electric Ind Co Ltd Optical film thickness monitor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5665974A (en) * 1979-11-02 1981-06-04 Komatsu Ltd Vapor deposition controlling method
JPS58140605A (en) * 1982-01-18 1983-08-20 Koshin Kogaku:Kk Controlling method of thickness of optical thin film
JPS62165103A (en) * 1986-01-17 1987-07-21 Canon Inc Method for measuring film thickness
EP0233610A2 (en) * 1986-02-15 1987-08-26 Sony Corporation Method and apparatus for vapor deposition
US4878755A (en) * 1986-03-29 1989-11-07 Leybold Aktiengesellschaft Process and device for measuring the optical properties of thin layers
JPH0443906A (en) * 1990-06-11 1992-02-13 Matsushita Electric Ind Co Ltd Optical film thickness monitor device

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