JPS5358774A - Position detecting method in electron beam exposure - Google Patents
Position detecting method in electron beam exposureInfo
- Publication number
- JPS5358774A JPS5358774A JP13396776A JP13396776A JPS5358774A JP S5358774 A JPS5358774 A JP S5358774A JP 13396776 A JP13396776 A JP 13396776A JP 13396776 A JP13396776 A JP 13396776A JP S5358774 A JPS5358774 A JP S5358774A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- position detecting
- detecting method
- beam exposure
- short side
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13396776A JPS5358774A (en) | 1976-11-08 | 1976-11-08 | Position detecting method in electron beam exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13396776A JPS5358774A (en) | 1976-11-08 | 1976-11-08 | Position detecting method in electron beam exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5358774A true JPS5358774A (en) | 1978-05-26 |
JPS5339751B2 JPS5339751B2 (US20110158925A1-20110630-C00042.png) | 1978-10-23 |
Family
ID=15117259
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13396776A Granted JPS5358774A (en) | 1976-11-08 | 1976-11-08 | Position detecting method in electron beam exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5358774A (US20110158925A1-20110630-C00042.png) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57138820U (US20110158925A1-20110630-C00042.png) * | 1981-02-24 | 1982-08-30 |
-
1976
- 1976-11-08 JP JP13396776A patent/JPS5358774A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5339751B2 (US20110158925A1-20110630-C00042.png) | 1978-10-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5316578A (en) | Electron beam exposure apparatus | |
JPS5352072A (en) | Pattern for alignment | |
JPS5323280A (en) | Electoron ray exposure device | |
JPS5358774A (en) | Position detecting method in electron beam exposure | |
JPS52103965A (en) | Electron beam projector unit | |
JPS53117463A (en) | Position detection method | |
JPS53123957A (en) | Position detecting method | |
JPS5365668A (en) | Electron beam exposure device | |
JPS5327439A (en) | Focus measuring device | |
JPS5315076A (en) | Electron beam position detection method | |
JPS5437685A (en) | Electron beam exposure unit | |
JPS5380168A (en) | Exposure method for electronic beam | |
JPS5346755A (en) | Thickness detector of plate form objects | |
JPS52122462A (en) | Electronic microscope | |
JPS5440572A (en) | Electron-beam pattern projector | |
JPS53120277A (en) | Electron beam exposure device | |
JPS52119844A (en) | Comparative examination method for two-dimensional picture | |
JPS52107494A (en) | Failed fuel detecting method | |
JPS5240163A (en) | Measurement method | |
JPS5321950A (en) | Detection of position | |
JPS5372466A (en) | Exposing unit for electron | |
JPS5349957A (en) | Focusing method for electronic beam exposure device | |
JPS53130033A (en) | Electron beam sensitive material | |
JPS5376054A (en) | Method of position detection | |
JPS52145897A (en) | Positioning method for machining using ultra-fine electron beam |