JPS5358774A - Position detecting method in electron beam exposure - Google Patents

Position detecting method in electron beam exposure

Info

Publication number
JPS5358774A
JPS5358774A JP13396776A JP13396776A JPS5358774A JP S5358774 A JPS5358774 A JP S5358774A JP 13396776 A JP13396776 A JP 13396776A JP 13396776 A JP13396776 A JP 13396776A JP S5358774 A JPS5358774 A JP S5358774A
Authority
JP
Japan
Prior art keywords
electron beam
position detecting
detecting method
beam exposure
short side
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13396776A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5339751B2 (US20110158925A1-20110630-C00042.png
Inventor
Hiroshi Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13396776A priority Critical patent/JPS5358774A/ja
Publication of JPS5358774A publication Critical patent/JPS5358774A/ja
Publication of JPS5339751B2 publication Critical patent/JPS5339751B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP13396776A 1976-11-08 1976-11-08 Position detecting method in electron beam exposure Granted JPS5358774A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13396776A JPS5358774A (en) 1976-11-08 1976-11-08 Position detecting method in electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13396776A JPS5358774A (en) 1976-11-08 1976-11-08 Position detecting method in electron beam exposure

Publications (2)

Publication Number Publication Date
JPS5358774A true JPS5358774A (en) 1978-05-26
JPS5339751B2 JPS5339751B2 (US20110158925A1-20110630-C00042.png) 1978-10-23

Family

ID=15117259

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13396776A Granted JPS5358774A (en) 1976-11-08 1976-11-08 Position detecting method in electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5358774A (US20110158925A1-20110630-C00042.png)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138820U (US20110158925A1-20110630-C00042.png) * 1981-02-24 1982-08-30

Also Published As

Publication number Publication date
JPS5339751B2 (US20110158925A1-20110630-C00042.png) 1978-10-23

Similar Documents

Publication Publication Date Title
JPS5316578A (en) Electron beam exposure apparatus
JPS5352072A (en) Pattern for alignment
JPS5323280A (en) Electoron ray exposure device
JPS5358774A (en) Position detecting method in electron beam exposure
JPS52103965A (en) Electron beam projector unit
JPS53117463A (en) Position detection method
JPS53123957A (en) Position detecting method
JPS5365668A (en) Electron beam exposure device
JPS5327439A (en) Focus measuring device
JPS5315076A (en) Electron beam position detection method
JPS5437685A (en) Electron beam exposure unit
JPS5380168A (en) Exposure method for electronic beam
JPS5346755A (en) Thickness detector of plate form objects
JPS52122462A (en) Electronic microscope
JPS5440572A (en) Electron-beam pattern projector
JPS53120277A (en) Electron beam exposure device
JPS52119844A (en) Comparative examination method for two-dimensional picture
JPS52107494A (en) Failed fuel detecting method
JPS5240163A (en) Measurement method
JPS5321950A (en) Detection of position
JPS5372466A (en) Exposing unit for electron
JPS5349957A (en) Focusing method for electronic beam exposure device
JPS53130033A (en) Electron beam sensitive material
JPS5376054A (en) Method of position detection
JPS52145897A (en) Positioning method for machining using ultra-fine electron beam