JPS5353314A - Sensitive high polymer composition and picture imae forming method usingsaid composition - Google Patents

Sensitive high polymer composition and picture imae forming method usingsaid composition

Info

Publication number
JPS5353314A
JPS5353314A JP12849776A JP12849776A JPS5353314A JP S5353314 A JPS5353314 A JP S5353314A JP 12849776 A JP12849776 A JP 12849776A JP 12849776 A JP12849776 A JP 12849776A JP S5353314 A JPS5353314 A JP S5353314A
Authority
JP
Japan
Prior art keywords
composition
usingsaid
imae
picture
forming method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12849776A
Other languages
English (en)
Japanese (ja)
Other versions
JPS544255B2 (enExample
Inventor
Norinaga Fujishige
Susumu Ichikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP12849776A priority Critical patent/JPS5353314A/ja
Publication of JPS5353314A publication Critical patent/JPS5353314A/ja
Publication of JPS544255B2 publication Critical patent/JPS544255B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP12849776A 1976-10-26 1976-10-26 Sensitive high polymer composition and picture imae forming method usingsaid composition Granted JPS5353314A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12849776A JPS5353314A (en) 1976-10-26 1976-10-26 Sensitive high polymer composition and picture imae forming method usingsaid composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12849776A JPS5353314A (en) 1976-10-26 1976-10-26 Sensitive high polymer composition and picture imae forming method usingsaid composition

Publications (2)

Publication Number Publication Date
JPS5353314A true JPS5353314A (en) 1978-05-15
JPS544255B2 JPS544255B2 (enExample) 1979-03-05

Family

ID=14986195

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12849776A Granted JPS5353314A (en) 1976-10-26 1976-10-26 Sensitive high polymer composition and picture imae forming method usingsaid composition

Country Status (1)

Country Link
JP (1) JPS5353314A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS55117239A (en) * 1979-03-02 1980-09-09 Fujitsu Ltd Making method of microminiature pattern
JPS55133042A (en) * 1979-04-04 1980-10-16 Fujitsu Ltd Pattern forming method
US7501220B2 (en) 2003-01-31 2009-03-10 Tokyo Ohka Kogyo Co., Ltd. Resist composition

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS55117239A (en) * 1979-03-02 1980-09-09 Fujitsu Ltd Making method of microminiature pattern
JPS55133042A (en) * 1979-04-04 1980-10-16 Fujitsu Ltd Pattern forming method
US7501220B2 (en) 2003-01-31 2009-03-10 Tokyo Ohka Kogyo Co., Ltd. Resist composition
US7527909B2 (en) 2003-01-31 2009-05-05 Tokyo Ohka Kogyo Co., Ltd. Resist composition
US7541138B2 (en) 2003-01-31 2009-06-02 Tokyo Ohka Kogyo Co., Ltd. Resist composition
US8198004B2 (en) 2003-01-31 2012-06-12 Tokyo Ohka Kogyo Co., Ltd. Resist composition

Also Published As

Publication number Publication date
JPS544255B2 (enExample) 1979-03-05

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