JPS5348477A - Formation method of photoresist mask - Google Patents

Formation method of photoresist mask

Info

Publication number
JPS5348477A
JPS5348477A JP12277376A JP12277376A JPS5348477A JP S5348477 A JPS5348477 A JP S5348477A JP 12277376 A JP12277376 A JP 12277376A JP 12277376 A JP12277376 A JP 12277376A JP S5348477 A JPS5348477 A JP S5348477A
Authority
JP
Japan
Prior art keywords
grooves
formation method
photoresist mask
resist
fluidizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12277376A
Other languages
Japanese (ja)
Inventor
Mitsuo Nanba
Keijiro Uehara
Yoichi Tamaoki
Koji Honma
Hisayuki Higuchi
Michiyoshi Maki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12277376A priority Critical patent/JPS5348477A/en
Publication of JPS5348477A publication Critical patent/JPS5348477A/en
Pending legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To perform flattening by coating photoresist over the entire surface of a specimen, etching off the resist corresponding to the resist film thickness over the bulged part outside grooves and heating and fluidizing the resist in the grooves to allow it creep up to the top end of the sloped surface of the grooves.
COPYRIGHT: (C)1978,JPO&Japio
JP12277376A 1976-10-15 1976-10-15 Formation method of photoresist mask Pending JPS5348477A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12277376A JPS5348477A (en) 1976-10-15 1976-10-15 Formation method of photoresist mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12277376A JPS5348477A (en) 1976-10-15 1976-10-15 Formation method of photoresist mask

Publications (1)

Publication Number Publication Date
JPS5348477A true JPS5348477A (en) 1978-05-01

Family

ID=14844247

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12277376A Pending JPS5348477A (en) 1976-10-15 1976-10-15 Formation method of photoresist mask

Country Status (1)

Country Link
JP (1) JPS5348477A (en)

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