JPS5346273A - Impurity diffusion method - Google Patents

Impurity diffusion method

Info

Publication number
JPS5346273A
JPS5346273A JP12139176A JP12139176A JPS5346273A JP S5346273 A JPS5346273 A JP S5346273A JP 12139176 A JP12139176 A JP 12139176A JP 12139176 A JP12139176 A JP 12139176A JP S5346273 A JPS5346273 A JP S5346273A
Authority
JP
Japan
Prior art keywords
diffusion
impurity diffusion
diffusion method
oxide
hampers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12139176A
Other languages
Japanese (ja)
Inventor
Sokichi Yamagishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP12139176A priority Critical patent/JPS5346273A/en
Publication of JPS5346273A publication Critical patent/JPS5346273A/en
Pending legal-status Critical Current

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  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To remove the oxide film which hampers the diffusion grown during the diffusion of the previous stage and obtain buried layers of low layer resistance with less variation by performing a deposition process by dividing it in short times of more than twice at the time of performing the diffusion by using a Sb or Sb oxide on Si wafer surface.
JP12139176A 1976-10-08 1976-10-08 Impurity diffusion method Pending JPS5346273A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12139176A JPS5346273A (en) 1976-10-08 1976-10-08 Impurity diffusion method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12139176A JPS5346273A (en) 1976-10-08 1976-10-08 Impurity diffusion method

Publications (1)

Publication Number Publication Date
JPS5346273A true JPS5346273A (en) 1978-04-25

Family

ID=14810025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12139176A Pending JPS5346273A (en) 1976-10-08 1976-10-08 Impurity diffusion method

Country Status (1)

Country Link
JP (1) JPS5346273A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6428840A (en) * 1987-07-23 1989-01-31 Sanken Electric Co Ltd Manufacture of integrated circuit
JP5952475B1 (en) * 2015-08-11 2016-07-13 直江津電子工業株式会社 Diffusion wafer and manufacturing method thereof
JP2018006640A (en) * 2016-07-06 2018-01-11 直江津電子工業株式会社 Manufacturing method of diffusion wafer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6428840A (en) * 1987-07-23 1989-01-31 Sanken Electric Co Ltd Manufacture of integrated circuit
JP5952475B1 (en) * 2015-08-11 2016-07-13 直江津電子工業株式会社 Diffusion wafer and manufacturing method thereof
JP2018006640A (en) * 2016-07-06 2018-01-11 直江津電子工業株式会社 Manufacturing method of diffusion wafer

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