JPS5244584A - Method of treating semiconductor substrate - Google Patents

Method of treating semiconductor substrate

Info

Publication number
JPS5244584A
JPS5244584A JP50120990A JP12099075A JPS5244584A JP S5244584 A JPS5244584 A JP S5244584A JP 50120990 A JP50120990 A JP 50120990A JP 12099075 A JP12099075 A JP 12099075A JP S5244584 A JPS5244584 A JP S5244584A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
treating semiconductor
treating
si3n4
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50120990A
Other languages
Japanese (ja)
Inventor
Tatsunori Nakajima
Kosei Kajiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP50120990A priority Critical patent/JPS5244584A/en
Publication of JPS5244584A publication Critical patent/JPS5244584A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To combine selective deposition of Si3N4 and epitaxial growth of Si thereby obtaining a flat and thick oxide film that does not cause disconnection in wiring to be formed later.
JP50120990A 1975-10-06 1975-10-06 Method of treating semiconductor substrate Pending JPS5244584A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50120990A JPS5244584A (en) 1975-10-06 1975-10-06 Method of treating semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50120990A JPS5244584A (en) 1975-10-06 1975-10-06 Method of treating semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS5244584A true JPS5244584A (en) 1977-04-07

Family

ID=14800042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50120990A Pending JPS5244584A (en) 1975-10-06 1975-10-06 Method of treating semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS5244584A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140641A (en) * 1980-04-01 1981-11-04 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS5952847A (en) * 1982-09-20 1984-03-27 Mitsubishi Electric Corp Manufacture of semiconductor device
US5225658A (en) * 1988-03-24 1993-07-06 Kabushiki Kaisha Komatsu Seisakusho Stopping a plasma arc cutter upon completion of cutting

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140641A (en) * 1980-04-01 1981-11-04 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS5952847A (en) * 1982-09-20 1984-03-27 Mitsubishi Electric Corp Manufacture of semiconductor device
US5225658A (en) * 1988-03-24 1993-07-06 Kabushiki Kaisha Komatsu Seisakusho Stopping a plasma arc cutter upon completion of cutting

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