JPS5344202A - Developer composition and developing method - Google Patents
Developer composition and developing methodInfo
- Publication number
- JPS5344202A JPS5344202A JP11821676A JP11821676A JPS5344202A JP S5344202 A JPS5344202 A JP S5344202A JP 11821676 A JP11821676 A JP 11821676A JP 11821676 A JP11821676 A JP 11821676A JP S5344202 A JPS5344202 A JP S5344202A
- Authority
- JP
- Japan
- Prior art keywords
- developing method
- developer composition
- developer
- composition
- developing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11821676A JPS5344202A (en) | 1976-10-01 | 1976-10-01 | Developer composition and developing method |
GB40231/77A GB1532340A (en) | 1976-10-01 | 1977-09-27 | Method of developing a lithographic printing plate |
FR7729283A FR2366598A1 (fr) | 1976-10-01 | 1977-09-29 | Procede de developpement d'une plaque de tirage lithographique |
CA287,872A CA1098752A (en) | 1976-10-01 | 1977-09-30 | Aqueous developer for a daizo lithographic printing plate including a benzyl alcohol or glycol ether derivative and sulfite |
DE2744097A DE2744097C2 (de) | 1976-10-01 | 1977-09-30 | Verfahren zur Entwicklung einer bildweise belichteten lichtempfindlichen lithographischen Druckplatte sowie Verwendung einer Entwicklerlösung zum Entwickeln einer Druckplatte |
US05/839,058 US4186006A (en) | 1976-10-01 | 1977-10-03 | Method for developing a lithographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11821676A JPS5344202A (en) | 1976-10-01 | 1976-10-01 | Developer composition and developing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5344202A true JPS5344202A (en) | 1978-04-20 |
JPS5642860B2 JPS5642860B2 (ja) | 1981-10-07 |
Family
ID=14731079
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11821676A Granted JPS5344202A (en) | 1976-10-01 | 1976-10-01 | Developer composition and developing method |
Country Status (6)
Country | Link |
---|---|
US (1) | US4186006A (ja) |
JP (1) | JPS5344202A (ja) |
CA (1) | CA1098752A (ja) |
DE (1) | DE2744097C2 (ja) |
FR (1) | FR2366598A1 (ja) |
GB (1) | GB1532340A (ja) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55134847A (en) * | 1979-04-06 | 1980-10-21 | Nec Corp | Manufacture of resist image |
JPS5650331A (en) * | 1979-08-06 | 1981-05-07 | Fromson H A | Lithographic print plate and producing same |
JPS575045A (en) * | 1980-06-12 | 1982-01-11 | Konishiroku Photo Ind Co Ltd | Developing method for photosensitive lithographic plate |
JPS57192951A (en) * | 1981-05-25 | 1982-11-27 | Konishiroku Photo Ind Co Ltd | Composition of developing solution |
JPS57192952A (en) * | 1981-05-25 | 1982-11-27 | Konishiroku Photo Ind Co Ltd | Composition of developing solution |
JPS606947A (ja) * | 1983-06-27 | 1985-01-14 | W R Gureesu:Kk | エツチング組成物 |
JPS60140239A (ja) * | 1983-12-28 | 1985-07-25 | Asahi Chem Ind Co Ltd | 現像廃液の安定化方法 |
JPS6234156A (ja) * | 1985-08-05 | 1987-02-14 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | 画像に相応して露光された写真部材の非画像区域を除去し得る組成物及び写真部材の製法 |
JPS63188142A (ja) * | 1987-01-30 | 1988-08-03 | Konica Corp | 発泡性および現像速度が改良された感光性平版印刷版の現像液および現像方法 |
WO1993002396A1 (fr) * | 1991-07-16 | 1993-02-04 | Mitsubishi Kasei Corporation | Methode de traitement de plaque offset a soustraction |
JPH06193857A (ja) * | 1992-02-05 | 1994-07-15 | Nepon Kk | 温水発生機の燃焼騒音低減装置 |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2809774A1 (de) * | 1978-03-07 | 1979-09-13 | Hoechst Ag | Verfahren und entwicklerloesung zum entwickeln von belichteten lichtempfindlichen kopierschichten |
JPS5552054A (en) * | 1978-10-11 | 1980-04-16 | Konishiroku Photo Ind Co Ltd | Developing solution composition |
JPS5587151A (en) * | 1978-12-25 | 1980-07-01 | Mitsubishi Chem Ind Ltd | Developing solution composition for lithographic printing plate |
US4414315A (en) * | 1979-08-06 | 1983-11-08 | Howard A. Fromson | Process for making lithographic printing plate |
NZ194648A (en) * | 1979-08-20 | 1982-12-07 | Vickers Ltd | Producing lithographic printing plate from radiation sensitive plate plate finishing composition |
US4391897A (en) * | 1979-10-12 | 1983-07-05 | Howard A. Fromson | Diazo lithographic printing plate developing process |
DE2941960A1 (de) * | 1979-10-17 | 1981-04-30 | Hoechst Ag, 6000 Frankfurt | Entwicklergemisch und verfahren zum entwickeln von von belichteten lichtempfindlichen kopierschichten |
US4370406A (en) * | 1979-12-26 | 1983-01-25 | Richardson Graphics Company | Developers for photopolymer lithographic plates |
JPS56132345A (en) * | 1980-03-21 | 1981-10-16 | Mitsubishi Chem Ind Ltd | Developer composition for lithographic plate |
US4308340A (en) * | 1980-08-08 | 1981-12-29 | American Hoechst Corporation | Aqueous 2-propoxyethanol containing processing composition for lithographic printing plates |
US4381340A (en) * | 1980-08-08 | 1983-04-26 | American Hoechst Corporation | Method of treating lithographic printing plates with 2-propoxyethanol |
DE3100259A1 (de) * | 1981-01-08 | 1982-08-05 | Hoechst Ag, 6000 Frankfurt | Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten |
US4501810A (en) * | 1981-09-30 | 1985-02-26 | Howard A. Fromson | Lithographic printing plate with resin reinforced image and process |
US4645730A (en) * | 1983-03-03 | 1987-02-24 | Howard A. Fromson | Lithographic printing plate with resin reinforced image |
US4786580A (en) * | 1983-12-27 | 1988-11-22 | Hoechst Celanese Corporation | Method of developing imaged diazo material with propanol containing developer composition |
US4785062A (en) * | 1984-07-31 | 1988-11-15 | W. R. Grace & Co.-Conn. | Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane resin and phenol with product having no remaining epoxy groups |
DE3439597A1 (de) * | 1984-10-30 | 1986-04-30 | Hoechst Ag, 6230 Frankfurt | Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers |
US4592992A (en) * | 1985-04-11 | 1986-06-03 | American Hoechst Corporation | Developer compositions for lithographic plates |
US5066568A (en) * | 1985-08-05 | 1991-11-19 | Hoehst Celanese Corporation | Method of developing negative working photographic elements |
US4692397A (en) * | 1985-11-27 | 1987-09-08 | American Hoechst Corporation | Process for developing an aqueous alkaline development diazo photographic element |
JPS63158552A (ja) * | 1986-12-23 | 1988-07-01 | Fuji Photo Film Co Ltd | 平版印刷版の製造方法 |
US4822723A (en) * | 1987-11-30 | 1989-04-18 | Hoechst Celanese Corporation | Developer compositions for heavy-duty lithographic printing plates |
US4912021A (en) * | 1988-02-03 | 1990-03-27 | Hoechst Celanese Corporation | Developer-finisher compositions for lithographic plates |
JP2626992B2 (ja) * | 1988-05-10 | 1997-07-02 | 富士写真フイルム株式会社 | 感光性平版印刷版用現像液組成物及び現像方法 |
US5278030A (en) * | 1988-10-24 | 1994-01-11 | Du Pont-Howson Limited | Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12 |
DE3836404A1 (de) * | 1988-10-26 | 1990-05-03 | Hoechst Ag | Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen |
US5035982A (en) * | 1989-07-14 | 1991-07-30 | Eastman Kodak Company | Aqueous developer composition for developing negative working lithographic printing plate |
US5122438A (en) * | 1989-11-02 | 1992-06-16 | Konica Corporation | Method for developing a waterless light-sensitive lithographic plate |
JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
US5316892A (en) * | 1992-07-23 | 1994-05-31 | Eastman Kodak Company | Method for developing lithographic printing plates |
US5279927A (en) * | 1992-07-23 | 1994-01-18 | Eastman Kodak Company | Aqueous developer for lithographic printing plates with improved desensitizing capability |
DE69315046T2 (de) * | 1992-12-17 | 1998-06-04 | Eastman Kodak Co | Wässriger Entwickler für lithographische Druckplatten der zu einer verringerten Schlammbildung führt |
US5380623A (en) * | 1992-12-17 | 1995-01-10 | Eastman Kodak Company | Aqueous developer for lithographic printing plates which provides improved oleophilicity |
JPH08101498A (ja) | 1994-08-03 | 1996-04-16 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JP3442176B2 (ja) | 1995-02-10 | 2003-09-02 | 富士写真フイルム株式会社 | 光重合性組成物 |
US5534381A (en) * | 1995-07-06 | 1996-07-09 | Minnesota Mining And Manufacturing Company | Acetal polymers useful in photosensitive compositions |
JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物 |
JP4291638B2 (ja) | 2003-07-29 | 2009-07-08 | 富士フイルム株式会社 | アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版 |
JP4452572B2 (ja) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物およびそれを用いた画像記録方法 |
JP4429116B2 (ja) | 2004-08-27 | 2010-03-10 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の製版方法 |
JP2006065074A (ja) | 2004-08-27 | 2006-03-09 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JP5089866B2 (ja) | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | 平版印刷方法 |
EP1701213A3 (en) | 2005-03-08 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
JP4538350B2 (ja) | 2005-03-18 | 2010-09-08 | 富士フイルム株式会社 | 感光性組成物および画像記録材料並びに画像記録方法 |
JP4574506B2 (ja) | 2005-03-23 | 2010-11-04 | 富士フイルム株式会社 | 平版印刷版原版、及びその製版方法 |
JP4524235B2 (ja) | 2005-03-29 | 2010-08-11 | 富士フイルム株式会社 | 平版印刷版原版 |
US8137897B2 (en) * | 2005-07-29 | 2012-03-20 | Anocoil Corporation | Processless development of printing plate |
US8133658B2 (en) * | 2005-07-29 | 2012-03-13 | Anocoil Corporation | Non-chemical development of printing plates |
US8377630B2 (en) * | 2005-07-29 | 2013-02-19 | Anocoil Corporation | On-press plate development without contamination of fountain fluid |
EP1910897A4 (en) * | 2005-07-29 | 2010-12-22 | Anocoil Corp | PRINTING PLATE THAT CAN BE IMAGED FOR PRESS DEVELOPMENT |
US8343707B2 (en) | 2005-07-29 | 2013-01-01 | Anocoil Corporation | Lithographic printing plate for in-solidus development on press |
JP4694324B2 (ja) | 2005-09-09 | 2011-06-08 | 富士フイルム株式会社 | 感光性平版印刷版の製造方法 |
JP4777226B2 (ja) | 2006-12-07 | 2011-09-21 | 富士フイルム株式会社 | 画像記録材料、及び新規化合物 |
JP4860525B2 (ja) | 2007-03-27 | 2012-01-25 | 富士フイルム株式会社 | 硬化性組成物及び平版印刷版原版 |
KR101412719B1 (ko) | 2007-07-17 | 2014-06-26 | 후지필름 가부시키가이샤 | 감광성 조성물, 경화성 조성물, 신규 화합물, 광중합성조성물, 컬러 필터, 및, 평판 인쇄판 원판 |
JP2009091555A (ja) | 2007-09-18 | 2009-04-30 | Fujifilm Corp | 硬化性組成物、画像形成材料及び平版印刷版原版 |
US7955781B2 (en) | 2007-09-28 | 2011-06-07 | Fujifilm Corporation | Negative-working photosensitive material and negative-working planographic printing plate precursor |
JP4890408B2 (ja) | 2007-09-28 | 2012-03-07 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法 |
JP5305704B2 (ja) | 2008-03-24 | 2013-10-02 | 富士フイルム株式会社 | 新規化合物、光重合性組成物、カラーフィルタ用光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版 |
JP5171506B2 (ja) | 2008-06-30 | 2013-03-27 | 富士フイルム株式会社 | 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版 |
JP5669386B2 (ja) | 2009-01-15 | 2015-02-12 | 富士フイルム株式会社 | 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版 |
JP5535814B2 (ja) | 2009-09-14 | 2014-07-02 | 富士フイルム株式会社 | 光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、液晶表示装置、平版印刷版原版、並びに、新規化合物 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3891439A (en) * | 1972-11-02 | 1975-06-24 | Polychrome Corp | Aqueous developing composition for lithographic diazo printing plates |
US3954472A (en) * | 1974-08-26 | 1976-05-04 | S. O. Litho Corporation | Substractive developer for negative working lithographic plates |
JPS5177401A (ja) * | 1974-12-26 | 1976-07-05 | Fuji Photo Film Co Ltd | Genzoekisoseibutsu |
-
1976
- 1976-10-01 JP JP11821676A patent/JPS5344202A/ja active Granted
-
1977
- 1977-09-27 GB GB40231/77A patent/GB1532340A/en not_active Expired
- 1977-09-29 FR FR7729283A patent/FR2366598A1/fr active Granted
- 1977-09-30 DE DE2744097A patent/DE2744097C2/de not_active Expired
- 1977-09-30 CA CA287,872A patent/CA1098752A/en not_active Expired
- 1977-10-03 US US05/839,058 patent/US4186006A/en not_active Expired - Lifetime
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55134847A (en) * | 1979-04-06 | 1980-10-21 | Nec Corp | Manufacture of resist image |
JPS5650331A (en) * | 1979-08-06 | 1981-05-07 | Fromson H A | Lithographic print plate and producing same |
JPH0237579B2 (ja) * | 1980-06-12 | 1990-08-24 | Konishiroku Photo Ind | |
JPS575045A (en) * | 1980-06-12 | 1982-01-11 | Konishiroku Photo Ind Co Ltd | Developing method for photosensitive lithographic plate |
JPS57192951A (en) * | 1981-05-25 | 1982-11-27 | Konishiroku Photo Ind Co Ltd | Composition of developing solution |
JPS57192952A (en) * | 1981-05-25 | 1982-11-27 | Konishiroku Photo Ind Co Ltd | Composition of developing solution |
JPS606947A (ja) * | 1983-06-27 | 1985-01-14 | W R Gureesu:Kk | エツチング組成物 |
JPS60140239A (ja) * | 1983-12-28 | 1985-07-25 | Asahi Chem Ind Co Ltd | 現像廃液の安定化方法 |
JPH0333251B2 (ja) * | 1983-12-28 | 1991-05-16 | Asahi Chemical Ind | |
JPS6234156A (ja) * | 1985-08-05 | 1987-02-14 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | 画像に相応して露光された写真部材の非画像区域を除去し得る組成物及び写真部材の製法 |
JPS63188142A (ja) * | 1987-01-30 | 1988-08-03 | Konica Corp | 発泡性および現像速度が改良された感光性平版印刷版の現像液および現像方法 |
WO1993002396A1 (fr) * | 1991-07-16 | 1993-02-04 | Mitsubishi Kasei Corporation | Methode de traitement de plaque offset a soustraction |
JPH06193857A (ja) * | 1992-02-05 | 1994-07-15 | Nepon Kk | 温水発生機の燃焼騒音低減装置 |
Also Published As
Publication number | Publication date |
---|---|
DE2744097A1 (de) | 1978-04-06 |
FR2366598B1 (ja) | 1981-07-24 |
JPS5642860B2 (ja) | 1981-10-07 |
GB1532340A (en) | 1978-11-15 |
FR2366598A1 (fr) | 1978-04-28 |
DE2744097C2 (de) | 1985-10-31 |
US4186006A (en) | 1980-01-29 |
CA1098752A (en) | 1981-04-07 |
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