JPS5344202A - Developer composition and developing method - Google Patents

Developer composition and developing method

Info

Publication number
JPS5344202A
JPS5344202A JP11821676A JP11821676A JPS5344202A JP S5344202 A JPS5344202 A JP S5344202A JP 11821676 A JP11821676 A JP 11821676A JP 11821676 A JP11821676 A JP 11821676A JP S5344202 A JPS5344202 A JP S5344202A
Authority
JP
Japan
Prior art keywords
developing method
developer composition
developer
composition
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11821676A
Other languages
English (en)
Other versions
JPS5642860B2 (ja
Inventor
Kasanao Kobayashi
Hiroshi Matsumoto
Yukihisa Narutomi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP11821676A priority Critical patent/JPS5344202A/ja
Priority to GB40231/77A priority patent/GB1532340A/en
Priority to FR7729283A priority patent/FR2366598A1/fr
Priority to CA287,872A priority patent/CA1098752A/en
Priority to DE2744097A priority patent/DE2744097C2/de
Priority to US05/839,058 priority patent/US4186006A/en
Publication of JPS5344202A publication Critical patent/JPS5344202A/ja
Publication of JPS5642860B2 publication Critical patent/JPS5642860B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP11821676A 1976-10-01 1976-10-01 Developer composition and developing method Granted JPS5344202A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP11821676A JPS5344202A (en) 1976-10-01 1976-10-01 Developer composition and developing method
GB40231/77A GB1532340A (en) 1976-10-01 1977-09-27 Method of developing a lithographic printing plate
FR7729283A FR2366598A1 (fr) 1976-10-01 1977-09-29 Procede de developpement d'une plaque de tirage lithographique
CA287,872A CA1098752A (en) 1976-10-01 1977-09-30 Aqueous developer for a daizo lithographic printing plate including a benzyl alcohol or glycol ether derivative and sulfite
DE2744097A DE2744097C2 (de) 1976-10-01 1977-09-30 Verfahren zur Entwicklung einer bildweise belichteten lichtempfindlichen lithographischen Druckplatte sowie Verwendung einer Entwicklerlösung zum Entwickeln einer Druckplatte
US05/839,058 US4186006A (en) 1976-10-01 1977-10-03 Method for developing a lithographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11821676A JPS5344202A (en) 1976-10-01 1976-10-01 Developer composition and developing method

Publications (2)

Publication Number Publication Date
JPS5344202A true JPS5344202A (en) 1978-04-20
JPS5642860B2 JPS5642860B2 (ja) 1981-10-07

Family

ID=14731079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11821676A Granted JPS5344202A (en) 1976-10-01 1976-10-01 Developer composition and developing method

Country Status (6)

Country Link
US (1) US4186006A (ja)
JP (1) JPS5344202A (ja)
CA (1) CA1098752A (ja)
DE (1) DE2744097C2 (ja)
FR (1) FR2366598A1 (ja)
GB (1) GB1532340A (ja)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS5650331A (en) * 1979-08-06 1981-05-07 Fromson H A Lithographic print plate and producing same
JPS575045A (en) * 1980-06-12 1982-01-11 Konishiroku Photo Ind Co Ltd Developing method for photosensitive lithographic plate
JPS57192951A (en) * 1981-05-25 1982-11-27 Konishiroku Photo Ind Co Ltd Composition of developing solution
JPS57192952A (en) * 1981-05-25 1982-11-27 Konishiroku Photo Ind Co Ltd Composition of developing solution
JPS606947A (ja) * 1983-06-27 1985-01-14 W R Gureesu:Kk エツチング組成物
JPS60140239A (ja) * 1983-12-28 1985-07-25 Asahi Chem Ind Co Ltd 現像廃液の安定化方法
JPS6234156A (ja) * 1985-08-05 1987-02-14 ヘキスト・セラニ−ズ・コ−ポレイシヨン 画像に相応して露光された写真部材の非画像区域を除去し得る組成物及び写真部材の製法
JPS63188142A (ja) * 1987-01-30 1988-08-03 Konica Corp 発泡性および現像速度が改良された感光性平版印刷版の現像液および現像方法
WO1993002396A1 (fr) * 1991-07-16 1993-02-04 Mitsubishi Kasei Corporation Methode de traitement de plaque offset a soustraction
JPH06193857A (ja) * 1992-02-05 1994-07-15 Nepon Kk 温水発生機の燃焼騒音低減装置

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2809774A1 (de) * 1978-03-07 1979-09-13 Hoechst Ag Verfahren und entwicklerloesung zum entwickeln von belichteten lichtempfindlichen kopierschichten
JPS5552054A (en) * 1978-10-11 1980-04-16 Konishiroku Photo Ind Co Ltd Developing solution composition
JPS5587151A (en) * 1978-12-25 1980-07-01 Mitsubishi Chem Ind Ltd Developing solution composition for lithographic printing plate
US4414315A (en) * 1979-08-06 1983-11-08 Howard A. Fromson Process for making lithographic printing plate
NZ194648A (en) * 1979-08-20 1982-12-07 Vickers Ltd Producing lithographic printing plate from radiation sensitive plate plate finishing composition
US4391897A (en) * 1979-10-12 1983-07-05 Howard A. Fromson Diazo lithographic printing plate developing process
DE2941960A1 (de) * 1979-10-17 1981-04-30 Hoechst Ag, 6000 Frankfurt Entwicklergemisch und verfahren zum entwickeln von von belichteten lichtempfindlichen kopierschichten
US4370406A (en) * 1979-12-26 1983-01-25 Richardson Graphics Company Developers for photopolymer lithographic plates
JPS56132345A (en) * 1980-03-21 1981-10-16 Mitsubishi Chem Ind Ltd Developer composition for lithographic plate
US4308340A (en) * 1980-08-08 1981-12-29 American Hoechst Corporation Aqueous 2-propoxyethanol containing processing composition for lithographic printing plates
US4381340A (en) * 1980-08-08 1983-04-26 American Hoechst Corporation Method of treating lithographic printing plates with 2-propoxyethanol
DE3100259A1 (de) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
US4501810A (en) * 1981-09-30 1985-02-26 Howard A. Fromson Lithographic printing plate with resin reinforced image and process
US4645730A (en) * 1983-03-03 1987-02-24 Howard A. Fromson Lithographic printing plate with resin reinforced image
US4786580A (en) * 1983-12-27 1988-11-22 Hoechst Celanese Corporation Method of developing imaged diazo material with propanol containing developer composition
US4785062A (en) * 1984-07-31 1988-11-15 W. R. Grace & Co.-Conn. Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane resin and phenol with product having no remaining epoxy groups
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
US4592992A (en) * 1985-04-11 1986-06-03 American Hoechst Corporation Developer compositions for lithographic plates
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
US4692397A (en) * 1985-11-27 1987-09-08 American Hoechst Corporation Process for developing an aqueous alkaline development diazo photographic element
JPS63158552A (ja) * 1986-12-23 1988-07-01 Fuji Photo Film Co Ltd 平版印刷版の製造方法
US4822723A (en) * 1987-11-30 1989-04-18 Hoechst Celanese Corporation Developer compositions for heavy-duty lithographic printing plates
US4912021A (en) * 1988-02-03 1990-03-27 Hoechst Celanese Corporation Developer-finisher compositions for lithographic plates
JP2626992B2 (ja) * 1988-05-10 1997-07-02 富士写真フイルム株式会社 感光性平版印刷版用現像液組成物及び現像方法
US5278030A (en) * 1988-10-24 1994-01-11 Du Pont-Howson Limited Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12
DE3836404A1 (de) * 1988-10-26 1990-05-03 Hoechst Ag Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen
US5035982A (en) * 1989-07-14 1991-07-30 Eastman Kodak Company Aqueous developer composition for developing negative working lithographic printing plate
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
US5316892A (en) * 1992-07-23 1994-05-31 Eastman Kodak Company Method for developing lithographic printing plates
US5279927A (en) * 1992-07-23 1994-01-18 Eastman Kodak Company Aqueous developer for lithographic printing plates with improved desensitizing capability
DE69315046T2 (de) * 1992-12-17 1998-06-04 Eastman Kodak Co Wässriger Entwickler für lithographische Druckplatten der zu einer verringerten Schlammbildung führt
US5380623A (en) * 1992-12-17 1995-01-10 Eastman Kodak Company Aqueous developer for lithographic printing plates which provides improved oleophilicity
JPH08101498A (ja) 1994-08-03 1996-04-16 Fuji Photo Film Co Ltd 感光性平版印刷版
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
US5534381A (en) * 1995-07-06 1996-07-09 Minnesota Mining And Manufacturing Company Acetal polymers useful in photosensitive compositions
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
JP4429116B2 (ja) 2004-08-27 2010-03-10 富士フイルム株式会社 平版印刷版原版及び平版印刷版の製版方法
JP2006065074A (ja) 2004-08-27 2006-03-09 Fuji Photo Film Co Ltd 感光性平版印刷版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4538350B2 (ja) 2005-03-18 2010-09-08 富士フイルム株式会社 感光性組成物および画像記録材料並びに画像記録方法
JP4574506B2 (ja) 2005-03-23 2010-11-04 富士フイルム株式会社 平版印刷版原版、及びその製版方法
JP4524235B2 (ja) 2005-03-29 2010-08-11 富士フイルム株式会社 平版印刷版原版
US8137897B2 (en) * 2005-07-29 2012-03-20 Anocoil Corporation Processless development of printing plate
US8133658B2 (en) * 2005-07-29 2012-03-13 Anocoil Corporation Non-chemical development of printing plates
US8377630B2 (en) * 2005-07-29 2013-02-19 Anocoil Corporation On-press plate development without contamination of fountain fluid
EP1910897A4 (en) * 2005-07-29 2010-12-22 Anocoil Corp PRINTING PLATE THAT CAN BE IMAGED FOR PRESS DEVELOPMENT
US8343707B2 (en) 2005-07-29 2013-01-01 Anocoil Corporation Lithographic printing plate for in-solidus development on press
JP4694324B2 (ja) 2005-09-09 2011-06-08 富士フイルム株式会社 感光性平版印刷版の製造方法
JP4777226B2 (ja) 2006-12-07 2011-09-21 富士フイルム株式会社 画像記録材料、及び新規化合物
JP4860525B2 (ja) 2007-03-27 2012-01-25 富士フイルム株式会社 硬化性組成物及び平版印刷版原版
KR101412719B1 (ko) 2007-07-17 2014-06-26 후지필름 가부시키가이샤 감광성 조성물, 경화성 조성물, 신규 화합물, 광중합성조성물, 컬러 필터, 및, 평판 인쇄판 원판
JP2009091555A (ja) 2007-09-18 2009-04-30 Fujifilm Corp 硬化性組成物、画像形成材料及び平版印刷版原版
US7955781B2 (en) 2007-09-28 2011-06-07 Fujifilm Corporation Negative-working photosensitive material and negative-working planographic printing plate precursor
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
JP5305704B2 (ja) 2008-03-24 2013-10-02 富士フイルム株式会社 新規化合物、光重合性組成物、カラーフィルタ用光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP5171506B2 (ja) 2008-06-30 2013-03-27 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP5669386B2 (ja) 2009-01-15 2015-02-12 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP5535814B2 (ja) 2009-09-14 2014-07-02 富士フイルム株式会社 光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、液晶表示装置、平版印刷版原版、並びに、新規化合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3891439A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
US3954472A (en) * 1974-08-26 1976-05-04 S. O. Litho Corporation Substractive developer for negative working lithographic plates
JPS5177401A (ja) * 1974-12-26 1976-07-05 Fuji Photo Film Co Ltd Genzoekisoseibutsu

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS5650331A (en) * 1979-08-06 1981-05-07 Fromson H A Lithographic print plate and producing same
JPH0237579B2 (ja) * 1980-06-12 1990-08-24 Konishiroku Photo Ind
JPS575045A (en) * 1980-06-12 1982-01-11 Konishiroku Photo Ind Co Ltd Developing method for photosensitive lithographic plate
JPS57192951A (en) * 1981-05-25 1982-11-27 Konishiroku Photo Ind Co Ltd Composition of developing solution
JPS57192952A (en) * 1981-05-25 1982-11-27 Konishiroku Photo Ind Co Ltd Composition of developing solution
JPS606947A (ja) * 1983-06-27 1985-01-14 W R Gureesu:Kk エツチング組成物
JPS60140239A (ja) * 1983-12-28 1985-07-25 Asahi Chem Ind Co Ltd 現像廃液の安定化方法
JPH0333251B2 (ja) * 1983-12-28 1991-05-16 Asahi Chemical Ind
JPS6234156A (ja) * 1985-08-05 1987-02-14 ヘキスト・セラニ−ズ・コ−ポレイシヨン 画像に相応して露光された写真部材の非画像区域を除去し得る組成物及び写真部材の製法
JPS63188142A (ja) * 1987-01-30 1988-08-03 Konica Corp 発泡性および現像速度が改良された感光性平版印刷版の現像液および現像方法
WO1993002396A1 (fr) * 1991-07-16 1993-02-04 Mitsubishi Kasei Corporation Methode de traitement de plaque offset a soustraction
JPH06193857A (ja) * 1992-02-05 1994-07-15 Nepon Kk 温水発生機の燃焼騒音低減装置

Also Published As

Publication number Publication date
DE2744097A1 (de) 1978-04-06
FR2366598B1 (ja) 1981-07-24
JPS5642860B2 (ja) 1981-10-07
GB1532340A (en) 1978-11-15
FR2366598A1 (fr) 1978-04-28
DE2744097C2 (de) 1985-10-31
US4186006A (en) 1980-01-29
CA1098752A (en) 1981-04-07

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