JPS5342571A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5342571A
JPS5342571A JP11799276A JP11799276A JPS5342571A JP S5342571 A JPS5342571 A JP S5342571A JP 11799276 A JP11799276 A JP 11799276A JP 11799276 A JP11799276 A JP 11799276A JP S5342571 A JPS5342571 A JP S5342571A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
substrate
mosfets
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11799276A
Other languages
Japanese (ja)
Inventor
Shinichi Ogawa
Shigehiro Miyatake
Shinya Yasue
Yasuo Torimaru
Katsumi Miyano
Takeo Fujimoto
Katsuteru Awane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP11799276A priority Critical patent/JPS5342571A/en
Publication of JPS5342571A publication Critical patent/JPS5342571A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To increase the scale of integration of MOSFETs by diffusion-forming drain, source regions in a semiconductor substrate, thereafter removing the oxide film used for mask, covering only the channel parts with resist, implanting impurity ions of the same conductivity type as that of the substrate, then providing gate regions therein.
JP11799276A 1976-09-29 1976-09-29 Production of semiconductor device Pending JPS5342571A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11799276A JPS5342571A (en) 1976-09-29 1976-09-29 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11799276A JPS5342571A (en) 1976-09-29 1976-09-29 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5342571A true JPS5342571A (en) 1978-04-18

Family

ID=14725337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11799276A Pending JPS5342571A (en) 1976-09-29 1976-09-29 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5342571A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1073256C (en) * 1995-01-19 2001-10-17 美国3M公司 Method for coating magnetic recording medium

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50120580A (en) * 1974-03-07 1975-09-20
JPS5136882A (en) * 1974-09-24 1976-03-27 Nippon Electric Co DENKAIKOKAHANDOTAISOCHINOSEIZOHOHO
JPS5156186A (en) * 1974-11-13 1976-05-17 Suwa Seikosha Kk HANDOTAISHUSEKIKAIRONO ZETSUENHOHO

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50120580A (en) * 1974-03-07 1975-09-20
JPS5136882A (en) * 1974-09-24 1976-03-27 Nippon Electric Co DENKAIKOKAHANDOTAISOCHINOSEIZOHOHO
JPS5156186A (en) * 1974-11-13 1976-05-17 Suwa Seikosha Kk HANDOTAISHUSEKIKAIRONO ZETSUENHOHO

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1073256C (en) * 1995-01-19 2001-10-17 美国3M公司 Method for coating magnetic recording medium

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