JPS5329676A - Gas treating method of semiconductor wafers - Google Patents
Gas treating method of semiconductor wafersInfo
- Publication number
- JPS5329676A JPS5329676A JP10459076A JP10459076A JPS5329676A JP S5329676 A JPS5329676 A JP S5329676A JP 10459076 A JP10459076 A JP 10459076A JP 10459076 A JP10459076 A JP 10459076A JP S5329676 A JPS5329676 A JP S5329676A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafers
- treating method
- gas treating
- wafers
- erecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10459076A JPS5329676A (en) | 1976-08-31 | 1976-08-31 | Gas treating method of semiconductor wafers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10459076A JPS5329676A (en) | 1976-08-31 | 1976-08-31 | Gas treating method of semiconductor wafers |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5329676A true JPS5329676A (en) | 1978-03-20 |
Family
ID=14384638
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10459076A Pending JPS5329676A (en) | 1976-08-31 | 1976-08-31 | Gas treating method of semiconductor wafers |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5329676A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5613003A (en) * | 1979-07-11 | 1981-02-07 | Daicel Chem Ind Ltd | Production of tubular semipermeable membrane |
US5164093A (en) * | 1991-11-29 | 1992-11-17 | Motorola, Inc. | Apparatus and method for removing metallic contamination from fluids using silicon beads |
-
1976
- 1976-08-31 JP JP10459076A patent/JPS5329676A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5613003A (en) * | 1979-07-11 | 1981-02-07 | Daicel Chem Ind Ltd | Production of tubular semipermeable membrane |
US5164093A (en) * | 1991-11-29 | 1992-11-17 | Motorola, Inc. | Apparatus and method for removing metallic contamination from fluids using silicon beads |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5329676A (en) | Gas treating method of semiconductor wafers | |
JPS53137685A (en) | Manufacture for semiconductor device | |
JPS56135975A (en) | Manufacture of semiconductor device | |
JPS5458381A (en) | Manufacture for semiconductor device | |
JPS5228879A (en) | Semiconductor device and method for its production | |
JPS51111056A (en) | Diffused layer forming method | |
JPS5222598A (en) | Etching method of chromium oxide | |
JPS52106681A (en) | Etching method | |
JPS5212579A (en) | Ion injection method and ion injector | |
JPS51115052A (en) | Contact oxidization type waste water treating method and apparatus | |
JPS53133366A (en) | Impurity diffusion method | |
JPS5251872A (en) | Production of semiconductor device | |
JPS532075A (en) | Appraisal method for semiconductor crystal | |
JPS52122475A (en) | Production of semiconductor device | |
JPS5379372A (en) | Production of silicon semoconductor device | |
JPS5211009A (en) | Magnetic sheet manufacturing process | |
JPS5211762A (en) | Method of manufacturing semiconductor devices | |
JPS5423485A (en) | Selective removal method of insulation film | |
JPS5313882A (en) | Production of semiconductor device | |
JPS5211867A (en) | Manufacturing method of a semiconductor device | |
JPS51134083A (en) | Method to manufacture the insulation film | |
JPS5263668A (en) | Production of semiconductor | |
JPS5353964A (en) | Electrode forming method of semiconductor device | |
JPS51122386A (en) | Manufacturing method of semiconductor device | |
JPS522377A (en) | Method of forming an electrode on a semiconductor element |