JPS5329075A - Plasma treating apparatus of semiconductor substrates - Google Patents

Plasma treating apparatus of semiconductor substrates

Info

Publication number
JPS5329075A
JPS5329075A JP10323776A JP10323776A JPS5329075A JP S5329075 A JPS5329075 A JP S5329075A JP 10323776 A JP10323776 A JP 10323776A JP 10323776 A JP10323776 A JP 10323776A JP S5329075 A JPS5329075 A JP S5329075A
Authority
JP
Japan
Prior art keywords
treating apparatus
semiconductor substrates
plasma treating
etching
microwaves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10323776A
Other languages
English (en)
Japanese (ja)
Other versions
JPS543344B2 (en:Method
Inventor
Kazuo Niwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP10323776A priority Critical patent/JPS5329075A/ja
Priority to US05/828,812 priority patent/US4138306A/en
Publication of JPS5329075A publication Critical patent/JPS5329075A/ja
Publication of JPS543344B2 publication Critical patent/JPS543344B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP10323776A 1976-08-31 1976-08-31 Plasma treating apparatus of semiconductor substrates Granted JPS5329075A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10323776A JPS5329075A (en) 1976-08-31 1976-08-31 Plasma treating apparatus of semiconductor substrates
US05/828,812 US4138306A (en) 1976-08-31 1977-08-29 Apparatus for the treatment of semiconductors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10323776A JPS5329075A (en) 1976-08-31 1976-08-31 Plasma treating apparatus of semiconductor substrates

Publications (2)

Publication Number Publication Date
JPS5329075A true JPS5329075A (en) 1978-03-17
JPS543344B2 JPS543344B2 (en:Method) 1979-02-21

Family

ID=14348829

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10323776A Granted JPS5329075A (en) 1976-08-31 1976-08-31 Plasma treating apparatus of semiconductor substrates

Country Status (1)

Country Link
JP (1) JPS5329075A (en:Method)

Also Published As

Publication number Publication date
JPS543344B2 (en:Method) 1979-02-21

Similar Documents

Publication Publication Date Title
JPS5329076A (en) Plasma treating apparatus of semiconductor substrates
JPS5224478A (en) Semiconductor device manufacturing process
JPS51129868A (en) A process for treatment of waste gas
JPS5329075A (en) Plasma treating apparatus of semiconductor substrates
JPS5298475A (en) Plasma treating apparatus
JPS52142970A (en) Plasma treating device
JPS5248468A (en) Process for production of semiconductor device
JPS53110378A (en) Plasma carrying device
JPS51136289A (en) Semi-conductor producing
JPS51140574A (en) Method of cleaning silicon substrate plate
JPS51131269A (en) Vapor phase propagation process and vapor phase propagation unit
JPS5384684A (en) Plasma etching device
JPS5396938A (en) Dry etching apparatus
JPS5329074A (en) Plasma treating apparatus for semiconductor
JPS5219070A (en) Distribution method
JPS5359368A (en) Plasma etching
JPS5477573A (en) Operating method of plasma treating apparatus
JPS5329065A (en) Vapour phase reaction unit of semiconductor
JPS51123949A (en) Process for drying and device thereof
JPS5373075A (en) Treatment method for wafer surface
JPS53125971A (en) Plasma apparatus
JPS51121840A (en) High frequency heating apparatus
JPS542670A (en) Plasma etching method
JPS53121468A (en) Manufacture for semiconductor device
JPS5248858A (en) Cooling process at negative pressure for straw mats