JPS5322456A - Apparatus for measuring and controlling thickness of thin layer generating optical effect - Google Patents

Apparatus for measuring and controlling thickness of thin layer generating optical effect

Info

Publication number
JPS5322456A
JPS5322456A JP7377577A JP7377577A JPS5322456A JP S5322456 A JPS5322456 A JP S5322456A JP 7377577 A JP7377577 A JP 7377577A JP 7377577 A JP7377577 A JP 7377577A JP S5322456 A JPS5322456 A JP S5322456A
Authority
JP
Japan
Prior art keywords
measuring
thin layer
optical effect
generating optical
layer generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7377577A
Other languages
English (en)
Japanese (ja)
Inventor
Shiyubuiikeru Horusuto
Torun Gerunooto
Peeteru Eeru Hansu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leybold Heraeus Verwaltung GmbH
Original Assignee
Leybold Heraeus Verwaltung GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus Verwaltung GmbH filed Critical Leybold Heraeus Verwaltung GmbH
Publication of JPS5322456A publication Critical patent/JPS5322456A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D5/00Control of dimensions of material
    • G05D5/02Control of dimensions of material of thickness, e.g. of rolled material
    • G05D5/03Control of dimensions of material of thickness, e.g. of rolled material characterised by the use of electric means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP7377577A 1976-06-21 1977-06-21 Apparatus for measuring and controlling thickness of thin layer generating optical effect Pending JPS5322456A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2627753A DE2627753C2 (de) 1976-06-21 1976-06-21 Anordnung zur Dickenmessung und -steuerung optisch wirksamer Dünnschichten

Publications (1)

Publication Number Publication Date
JPS5322456A true JPS5322456A (en) 1978-03-01

Family

ID=5981051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7377577A Pending JPS5322456A (en) 1976-06-21 1977-06-21 Apparatus for measuring and controlling thickness of thin layer generating optical effect

Country Status (16)

Country Link
US (1) US4207835A (US08063081-20111122-C00044.png)
JP (1) JPS5322456A (US08063081-20111122-C00044.png)
AT (1) AT366505B (US08063081-20111122-C00044.png)
AU (1) AU520695B2 (US08063081-20111122-C00044.png)
BE (1) BE855932A (US08063081-20111122-C00044.png)
CA (1) CA1082486A (US08063081-20111122-C00044.png)
CH (1) CH616502A5 (US08063081-20111122-C00044.png)
DE (1) DE2627753C2 (US08063081-20111122-C00044.png)
ES (2) ES459933A1 (US08063081-20111122-C00044.png)
FR (1) FR2356191A1 (US08063081-20111122-C00044.png)
GB (2) GB1567555A (US08063081-20111122-C00044.png)
IT (1) IT1086231B (US08063081-20111122-C00044.png)
NL (1) NL186235C (US08063081-20111122-C00044.png)
SE (2) SE433003B (US08063081-20111122-C00044.png)
SU (1) SU845804A3 (US08063081-20111122-C00044.png)
ZA (1) ZA773609B (US08063081-20111122-C00044.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52102783A (en) * 1976-02-25 1977-08-29 Kanagawa Prefecture Method of measuring maximum diameter of bruise in brinell hardness test

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI69370C (fi) * 1981-08-18 1986-01-10 Topwave Instr Oy Foerfarande foer maetning av egenskaperna hos ett plastskikt med hjaelp av infraroed straolning
DE3135443A1 (de) * 1981-09-08 1983-03-24 Leybold-Heraeus GmbH, 5000 Köln Verfahren und fotometrische anordnung zur dickenmessung und -steuerung optisch wirksamer schichten
DE3234534C2 (de) * 1982-09-17 1986-09-11 Kievskoe naučno-proizvodstvennoe obiedinenie "Analitpribor", Kiev Anordnung zum Aufstäuben von optischen Filmschichten
DE3220282C3 (de) * 1982-05-28 1995-05-18 Roland Man Druckmasch Vorrichtung zum betrieblichen Erfassen eines Maßes für die Feuchtmittelmenge auf der rotierenden Druckplatte in Offset-Druckmaschinen
FR2531775A1 (fr) * 1982-08-12 1984-02-17 Cit Alcatel Dispositif de mesure de l'epaisseur d'une couche deposee sur un substrat transparent
US4676883A (en) * 1986-03-03 1987-06-30 Sierracin Corporation Optical disk transmission monitor for deposited films
EP0290657A1 (de) * 1987-05-15 1988-11-17 KSB Aktiengesellschaft Verfahren und Vorrichtung zur Messung der optischen Eigenschaften von dünnen Schichten
US4669418A (en) * 1986-05-19 1987-06-02 Gte Laboratories Incorporated Optical coating apparatus
DE3623106C1 (en) * 1986-07-09 1987-12-10 Hewlett Packard Gmbh Optoelectronic measuring device having a light (optical) chopper
DE3803840A1 (de) * 1988-02-09 1989-08-17 Leybold Ag Fotometer
DE4123589C2 (de) * 1991-07-17 2001-03-29 Leybold Ag Vorrichtung zum Messen der Lichtstrahlung eines Plasmas
US5504695A (en) * 1992-11-17 1996-04-02 Nissan Motor Co., Ltd. Apparatus for measuring paint film thickness based on dynamic levelling property of wet paint film surface
DE4314251C2 (de) * 1993-04-30 2002-02-21 Unaxis Deutschland Holding Verfahren und Vorrichtung zum Aufdampfen absorbierender dünner Schichten auf ein Substrat
DE102005008889B4 (de) * 2005-02-26 2016-07-07 Leybold Optics Gmbh Optisches Monitoringsystem für Beschichtungsprozesse
US8958156B1 (en) 2007-05-30 2015-02-17 Semrock, Inc. Interference filter for non-zero angle of incidence spectroscopy
DE102018205236A1 (de) * 2018-04-06 2019-10-10 Bhs-Sonthofen Gmbh Vorrichtung und Verfahren zur Messung einer Filterkuchendicke

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1079920B (de) * 1952-04-25 1960-04-14 Technicolor Corp Verfahren und Vorrichtung zum Aufdampfen von mehrschichtigen dichromatischen Interferenzueberzuegen im Vakuum
DE1797108U (de) 1959-07-17 1959-10-01 Schubert & Salzer Maschinen Speisevorrichtung fuer karden schlagmaschinen u. dgl.
DE1276976B (de) * 1962-01-29 1968-09-05 Lab Pristroje Narodni Podnik Verfahren und Vorrichtung zur optischen Schichtdickenmessung duenner Schichten waehrend ihrer Herstellung durch Aufdampfen im Vakuum
DE1548262B2 (de) * 1966-10-13 1970-05-06 Leybold-Heraeus GmbH & Co KG, 5OOO Köln-Bayenthal Optisches Gerät zur Messung von Schichtdicken in Vakuumaufdampfprozessen
US3491240A (en) * 1967-03-29 1970-01-20 Itek Corp Noncontacting surface sensor
US3526460A (en) * 1967-06-27 1970-09-01 Webb James E Optical characteristics measuring apparatus
FR1539538A (fr) * 1967-10-05 1968-09-13 Leybold Hochvakuum Anlagen Gmb Instrument optique de mesure de l'épaisseur de couches déposées par métallisationsous vide
US3654109A (en) * 1968-04-25 1972-04-04 Ibm Apparatus and method for measuring rate in flow processes
US3737237A (en) * 1971-11-18 1973-06-05 Nasa Monitoring deposition of films
DE2220231A1 (de) * 1972-04-25 1973-11-08 Serv Anstalt Photometer zur digitalen anzeige der lichtabsorption einer messprobe in einer kuevette
US3869211A (en) * 1972-06-29 1975-03-04 Canon Kk Instrument for measuring thickness of thin film
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
US4024291A (en) * 1975-06-17 1977-05-17 Leybold-Heraeus Gmbh & Co. Kg Control of vapor deposition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52102783A (en) * 1976-02-25 1977-08-29 Kanagawa Prefecture Method of measuring maximum diameter of bruise in brinell hardness test
JPS5653681B2 (US08063081-20111122-C00044.png) * 1976-02-25 1981-12-21

Also Published As

Publication number Publication date
GB1567556A (en) 1980-05-14
SE8204900L (sv) 1982-08-27
ATA434977A (de) 1981-08-15
SE7707141L (sv) 1977-12-22
AU2625977A (en) 1979-01-04
AU520695B2 (en) 1982-02-25
ZA773609B (en) 1978-06-28
NL186235C (nl) 1990-10-16
GB1567555A (en) 1980-05-14
ES459933A1 (es) 1978-04-16
CH616502A5 (US08063081-20111122-C00044.png) 1980-03-31
BE855932A (fr) 1977-10-17
AT366505B (de) 1982-04-26
SU845804A3 (ru) 1981-07-07
FR2356191B1 (US08063081-20111122-C00044.png) 1984-06-22
SE8204900D0 (sv) 1982-08-27
DE2627753C2 (de) 1983-09-01
ES462916A1 (es) 1978-06-16
SE456775B (sv) 1988-10-31
CA1082486A (en) 1980-07-29
NL7706712A (nl) 1977-12-23
DE2627753A1 (de) 1977-12-29
US4207835A (en) 1980-06-17
IT1086231B (it) 1985-05-28
NL186235B (nl) 1990-05-16
FR2356191A1 (fr) 1978-01-20
SE433003B (sv) 1984-04-30

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