ES462916A1 - Un aparato fotometrico perfeccionado. - Google Patents

Un aparato fotometrico perfeccionado.

Info

Publication number
ES462916A1
ES462916A1 ES462916A ES462916A ES462916A1 ES 462916 A1 ES462916 A1 ES 462916A1 ES 462916 A ES462916 A ES 462916A ES 462916 A ES462916 A ES 462916A ES 462916 A1 ES462916 A1 ES 462916A1
Authority
ES
Spain
Prior art keywords
photometer
measuring
arrangement
thickness
controlling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES462916A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold Heraeus GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus GmbH filed Critical Leybold Heraeus GmbH
Publication of ES462916A1 publication Critical patent/ES462916A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D5/00—Control of dimensions of material
    • G05D5/02—Control of dimensions of material of thickness, e.g. of rolled material
    • G05D5/03—Control of dimensions of material of thickness, e.g. of rolled material characterised by the use of electric means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

Un aparato fotométrico perfeccionado para una disposición para la medición y control de espesores de capas delgadas ópticamente activas durante su formación en instalaciones de recubrimiento en el vacío, averiguando el comportamiento a la reflexión o a la transmisión de espesores de capa entre fracciones y algunos múltiplos de la longitud de onda de la luz de medición empleada, en esencia monocromática, y por interrupción del proceso de recubrimiento al alcanzarse un espesor de capa predeterminado, consistente en una fuente de luz de medición para la emisión de un rayo enfocado de luz de medición, un dispositivo cortador, un divisor del rayo dispuesto en el eje del rayo de luz de medición bajo un ángulo de 45 grados, estando dirigida la parte del rayo de luz de medición que discurre por detrás del divisor del rayo hacia el objeto de medición, en un receptor de la luz de medición con monocromador antepuesto.
ES462916A 1976-06-21 1977-10-05 Un aparato fotometrico perfeccionado. Expired ES462916A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2627753A DE2627753C2 (de) 1976-06-21 1976-06-21 Anordnung zur Dickenmessung und -steuerung optisch wirksamer Dünnschichten

Publications (1)

Publication Number Publication Date
ES462916A1 true ES462916A1 (es) 1978-06-16

Family

ID=5981051

Family Applications (2)

Application Number Title Priority Date Filing Date
ES459933A Expired ES459933A1 (es) 1976-06-21 1977-06-20 Perfeccionamientos introducidos en una disposicion para la medicion y control de espesores de capas delgadas opticamen-te activas.
ES462916A Expired ES462916A1 (es) 1976-06-21 1977-10-05 Un aparato fotometrico perfeccionado.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
ES459933A Expired ES459933A1 (es) 1976-06-21 1977-06-20 Perfeccionamientos introducidos en una disposicion para la medicion y control de espesores de capas delgadas opticamen-te activas.

Country Status (16)

Country Link
US (1) US4207835A (es)
JP (1) JPS5322456A (es)
AT (1) AT366505B (es)
AU (1) AU520695B2 (es)
BE (1) BE855932A (es)
CA (1) CA1082486A (es)
CH (1) CH616502A5 (es)
DE (1) DE2627753C2 (es)
ES (2) ES459933A1 (es)
FR (1) FR2356191A1 (es)
GB (2) GB1567555A (es)
IT (1) IT1086231B (es)
NL (1) NL186235C (es)
SE (2) SE433003B (es)
SU (1) SU845804A3 (es)
ZA (1) ZA773609B (es)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52102783A (en) * 1976-02-25 1977-08-29 Kanagawa Prefecture Method of measuring maximum diameter of bruise in brinell hardness test
FI69370C (fi) * 1981-08-18 1986-01-10 Topwave Instr Oy Foerfarande foer maetning av egenskaperna hos ett plastskikt med hjaelp av infraroed straolning
DE3135443A1 (de) * 1981-09-08 1983-03-24 Leybold-Heraeus GmbH, 5000 Köln Verfahren und fotometrische anordnung zur dickenmessung und -steuerung optisch wirksamer schichten
DE3234534C2 (de) * 1982-09-17 1986-09-11 Kievskoe naučno-proizvodstvennoe obiedinenie "Analitpribor", Kiev Anordnung zum Aufstäuben von optischen Filmschichten
DE3220282C3 (de) * 1982-05-28 1995-05-18 Roland Man Druckmasch Vorrichtung zum betrieblichen Erfassen eines Maßes für die Feuchtmittelmenge auf der rotierenden Druckplatte in Offset-Druckmaschinen
FR2531775A1 (fr) * 1982-08-12 1984-02-17 Cit Alcatel Dispositif de mesure de l'epaisseur d'une couche deposee sur un substrat transparent
US4676883A (en) * 1986-03-03 1987-06-30 Sierracin Corporation Optical disk transmission monitor for deposited films
EP0290657A1 (de) * 1987-05-15 1988-11-17 KSB Aktiengesellschaft Verfahren und Vorrichtung zur Messung der optischen Eigenschaften von dünnen Schichten
US4669418A (en) * 1986-05-19 1987-06-02 Gte Laboratories Incorporated Optical coating apparatus
DE3623106C1 (en) * 1986-07-09 1987-12-10 Hewlett Packard Gmbh Optoelectronic measuring device having a light (optical) chopper
DE3803840A1 (de) * 1988-02-09 1989-08-17 Leybold Ag Fotometer
DE4123589C2 (de) * 1991-07-17 2001-03-29 Leybold Ag Vorrichtung zum Messen der Lichtstrahlung eines Plasmas
GB2272517B (en) * 1992-11-17 1996-04-24 Nissan Motor Measurement of paint film thickness based on dynamic levelling property of wet paint
DE4314251C2 (de) * 1993-04-30 2002-02-21 Unaxis Deutschland Holding Verfahren und Vorrichtung zum Aufdampfen absorbierender dünner Schichten auf ein Substrat
DE102005008889B4 (de) * 2005-02-26 2016-07-07 Leybold Optics Gmbh Optisches Monitoringsystem für Beschichtungsprozesse
US8958156B1 (en) 2007-05-30 2015-02-17 Semrock, Inc. Interference filter for non-zero angle of incidence spectroscopy
DE102018205236A1 (de) * 2018-04-06 2019-10-10 Bhs-Sonthofen Gmbh Vorrichtung und Verfahren zur Messung einer Filterkuchendicke

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1079920B (de) * 1952-04-25 1960-04-14 Technicolor Corp Verfahren und Vorrichtung zum Aufdampfen von mehrschichtigen dichromatischen Interferenzueberzuegen im Vakuum
DE1797108U (de) 1959-07-17 1959-10-01 Schubert & Salzer Maschinen Speisevorrichtung fuer karden schlagmaschinen u. dgl.
DE1276976B (de) * 1962-01-29 1968-09-05 Lab Pristroje Narodni Podnik Verfahren und Vorrichtung zur optischen Schichtdickenmessung duenner Schichten waehrend ihrer Herstellung durch Aufdampfen im Vakuum
DE1548262B2 (de) * 1966-10-13 1970-05-06 Leybold-Heraeus GmbH & Co KG, 5OOO Köln-Bayenthal Optisches Gerät zur Messung von Schichtdicken in Vakuumaufdampfprozessen
US3491240A (en) * 1967-03-29 1970-01-20 Itek Corp Noncontacting surface sensor
US3526460A (en) * 1967-06-27 1970-09-01 Webb James E Optical characteristics measuring apparatus
FR1539538A (fr) * 1967-10-05 1968-09-13 Leybold Hochvakuum Anlagen Gmb Instrument optique de mesure de l'épaisseur de couches déposées par métallisationsous vide
US3654109A (en) * 1968-04-25 1972-04-04 Ibm Apparatus and method for measuring rate in flow processes
US3737237A (en) * 1971-11-18 1973-06-05 Nasa Monitoring deposition of films
DE2220231A1 (de) * 1972-04-25 1973-11-08 Serv Anstalt Photometer zur digitalen anzeige der lichtabsorption einer messprobe in einer kuevette
US3869211A (en) * 1972-06-29 1975-03-04 Canon Kk Instrument for measuring thickness of thin film
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
US4024291A (en) * 1975-06-17 1977-05-17 Leybold-Heraeus Gmbh & Co. Kg Control of vapor deposition

Also Published As

Publication number Publication date
FR2356191A1 (fr) 1978-01-20
SU845804A3 (ru) 1981-07-07
DE2627753A1 (de) 1977-12-29
DE2627753C2 (de) 1983-09-01
SE8204900L (sv) 1982-08-27
AU520695B2 (en) 1982-02-25
IT1086231B (it) 1985-05-28
AT366505B (de) 1982-04-26
BE855932A (fr) 1977-10-17
FR2356191B1 (es) 1984-06-22
NL186235C (nl) 1990-10-16
CH616502A5 (es) 1980-03-31
JPS5322456A (en) 1978-03-01
CA1082486A (en) 1980-07-29
ES459933A1 (es) 1978-04-16
NL7706712A (nl) 1977-12-23
ATA434977A (de) 1981-08-15
NL186235B (nl) 1990-05-16
US4207835A (en) 1980-06-17
SE7707141L (sv) 1977-12-22
GB1567556A (en) 1980-05-14
SE456775B (sv) 1988-10-31
AU2625977A (en) 1979-01-04
SE433003B (sv) 1984-04-30
SE8204900D0 (sv) 1982-08-27
ZA773609B (en) 1978-06-28
GB1567555A (en) 1980-05-14

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19971103