FR2356191A1 - Montage et photometre pour la mesure et la commande de l'epaisseur de couches minces optiques - Google Patents
Montage et photometre pour la mesure et la commande de l'epaisseur de couches minces optiquesInfo
- Publication number
- FR2356191A1 FR2356191A1 FR7719017A FR7719017A FR2356191A1 FR 2356191 A1 FR2356191 A1 FR 2356191A1 FR 7719017 A FR7719017 A FR 7719017A FR 7719017 A FR7719017 A FR 7719017A FR 2356191 A1 FR2356191 A1 FR 2356191A1
- Authority
- FR
- France
- Prior art keywords
- thickness
- measurement
- photometer
- mounting
- control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005259 measurement Methods 0.000 title abstract 3
- 230000003287 optical effect Effects 0.000 title abstract 3
- 238000009434 installation Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D5/00—Control of dimensions of material
- G05D5/02—Control of dimensions of material of thickness, e.g. of rolled material
- G05D5/03—Control of dimensions of material of thickness, e.g. of rolled material characterised by the use of electric means
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Montage de mesure et de commande de l'épaisseur de couches optiques minces pendant leur production dans des équipements de dépôt sous vide. L'axe du faisceau de mesure 22 provenant de la source 23 est dirigé sur l'échantillon 16. Un récepteur de référence 26, indépendant des propriétés optiques de l'échantillon 16, est affecté au faisceau de mesure 23. Le signal de sortie du récepteur de référence 26 est appliqué au déclencheur 43 d'un amplificateur photométrique 46 sensible à la phase et, en parallèle, à un amplificateur 41 de compensation des fluctuations de luminance de la source 22.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2627753A DE2627753C2 (de) | 1976-06-21 | 1976-06-21 | Anordnung zur Dickenmessung und -steuerung optisch wirksamer Dünnschichten |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2356191A1 true FR2356191A1 (fr) | 1978-01-20 |
FR2356191B1 FR2356191B1 (fr) | 1984-06-22 |
Family
ID=5981051
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7719017A Granted FR2356191A1 (fr) | 1976-06-21 | 1977-06-21 | Montage et photometre pour la mesure et la commande de l'epaisseur de couches minces optiques |
Country Status (16)
Country | Link |
---|---|
US (1) | US4207835A (fr) |
JP (1) | JPS5322456A (fr) |
AT (1) | AT366505B (fr) |
AU (1) | AU520695B2 (fr) |
BE (1) | BE855932A (fr) |
CA (1) | CA1082486A (fr) |
CH (1) | CH616502A5 (fr) |
DE (1) | DE2627753C2 (fr) |
ES (2) | ES459933A1 (fr) |
FR (1) | FR2356191A1 (fr) |
GB (2) | GB1567556A (fr) |
IT (1) | IT1086231B (fr) |
NL (1) | NL186235C (fr) |
SE (2) | SE433003B (fr) |
SU (1) | SU845804A3 (fr) |
ZA (1) | ZA773609B (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2531775A1 (fr) * | 1982-08-12 | 1984-02-17 | Cit Alcatel | Dispositif de mesure de l'epaisseur d'une couche deposee sur un substrat transparent |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52102783A (en) * | 1976-02-25 | 1977-08-29 | Kanagawa Prefecture | Method of measuring maximum diameter of bruise in brinell hardness test |
FI69370C (fi) * | 1981-08-18 | 1986-01-10 | Topwave Instr Oy | Foerfarande foer maetning av egenskaperna hos ett plastskikt med hjaelp av infraroed straolning |
DE3135443A1 (de) * | 1981-09-08 | 1983-03-24 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und fotometrische anordnung zur dickenmessung und -steuerung optisch wirksamer schichten |
DE3234534C2 (de) * | 1982-09-17 | 1986-09-11 | Kievskoe naučno-proizvodstvennoe obiedinenie "Analitpribor", Kiev | Anordnung zum Aufstäuben von optischen Filmschichten |
DE3220282C3 (de) * | 1982-05-28 | 1995-05-18 | Roland Man Druckmasch | Vorrichtung zum betrieblichen Erfassen eines Maßes für die Feuchtmittelmenge auf der rotierenden Druckplatte in Offset-Druckmaschinen |
US4676883A (en) * | 1986-03-03 | 1987-06-30 | Sierracin Corporation | Optical disk transmission monitor for deposited films |
EP0290657A1 (fr) * | 1987-05-15 | 1988-11-17 | KSB Aktiengesellschaft | Méthode et dispositif pour mesurer les propriétés optiques des couches fines |
US4669418A (en) * | 1986-05-19 | 1987-06-02 | Gte Laboratories Incorporated | Optical coating apparatus |
DE3623106C1 (en) * | 1986-07-09 | 1987-12-10 | Hewlett Packard Gmbh | Optoelectronic measuring device having a light (optical) chopper |
DE3803840A1 (de) * | 1988-02-09 | 1989-08-17 | Leybold Ag | Fotometer |
DE4123589C2 (de) * | 1991-07-17 | 2001-03-29 | Leybold Ag | Vorrichtung zum Messen der Lichtstrahlung eines Plasmas |
GB2272517B (en) * | 1992-11-17 | 1996-04-24 | Nissan Motor | Measurement of paint film thickness based on dynamic levelling property of wet paint |
DE4314251C2 (de) * | 1993-04-30 | 2002-02-21 | Unaxis Deutschland Holding | Verfahren und Vorrichtung zum Aufdampfen absorbierender dünner Schichten auf ein Substrat |
DE102005008889B4 (de) * | 2005-02-26 | 2016-07-07 | Leybold Optics Gmbh | Optisches Monitoringsystem für Beschichtungsprozesse |
US8958156B1 (en) | 2007-05-30 | 2015-02-17 | Semrock, Inc. | Interference filter for non-zero angle of incidence spectroscopy |
DE102018205236A1 (de) * | 2018-04-06 | 2019-10-10 | Bhs-Sonthofen Gmbh | Vorrichtung und Verfahren zur Messung einer Filterkuchendicke |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1539538A (fr) * | 1967-10-05 | 1968-09-13 | Leybold Hochvakuum Anlagen Gmb | Instrument optique de mesure de l'épaisseur de couches déposées par métallisationsous vide |
FR1558072A (fr) * | 1967-03-29 | 1969-02-21 | ||
US3544222A (en) * | 1966-10-13 | 1970-12-01 | Leybold Hochvakuum Anlagen Gmb | Optical instrument for determining layer thickness |
US3737237A (en) * | 1971-11-18 | 1973-06-05 | Nasa | Monitoring deposition of films |
US3869211A (en) * | 1972-06-29 | 1975-03-04 | Canon Kk | Instrument for measuring thickness of thin film |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1079920B (de) * | 1952-04-25 | 1960-04-14 | Technicolor Corp | Verfahren und Vorrichtung zum Aufdampfen von mehrschichtigen dichromatischen Interferenzueberzuegen im Vakuum |
DE1797108U (de) | 1959-07-17 | 1959-10-01 | Schubert & Salzer Maschinen | Speisevorrichtung fuer karden schlagmaschinen u. dgl. |
DE1276976B (de) * | 1962-01-29 | 1968-09-05 | Lab Pristroje Narodni Podnik | Verfahren und Vorrichtung zur optischen Schichtdickenmessung duenner Schichten waehrend ihrer Herstellung durch Aufdampfen im Vakuum |
US3526460A (en) * | 1967-06-27 | 1970-09-01 | Webb James E | Optical characteristics measuring apparatus |
US3654109A (en) * | 1968-04-25 | 1972-04-04 | Ibm | Apparatus and method for measuring rate in flow processes |
DE2220231A1 (de) * | 1972-04-25 | 1973-11-08 | Serv Anstalt | Photometer zur digitalen anzeige der lichtabsorption einer messprobe in einer kuevette |
US3892490A (en) * | 1974-03-06 | 1975-07-01 | Minolta Camera Kk | Monitoring system for coating a substrate |
US4024291A (en) * | 1975-06-17 | 1977-05-17 | Leybold-Heraeus Gmbh & Co. Kg | Control of vapor deposition |
-
1976
- 1976-06-21 DE DE2627753A patent/DE2627753C2/de not_active Expired
-
1977
- 1977-06-09 IT IT24553/77A patent/IT1086231B/it active
- 1977-06-13 CH CH721877A patent/CH616502A5/de not_active IP Right Cessation
- 1977-06-16 ZA ZA00773609A patent/ZA773609B/xx unknown
- 1977-06-16 CA CA280,674A patent/CA1082486A/fr not_active Expired
- 1977-06-16 US US05/807,290 patent/US4207835A/en not_active Expired - Lifetime
- 1977-06-17 NL NLAANVRAGE7706712,A patent/NL186235C/xx not_active IP Right Cessation
- 1977-06-20 GB GB11473/79A patent/GB1567556A/en not_active Expired
- 1977-06-20 ES ES459933A patent/ES459933A1/es not_active Expired
- 1977-06-20 AT AT0434977A patent/AT366505B/de not_active IP Right Cessation
- 1977-06-20 GB GB25702/77A patent/GB1567555A/en not_active Expired
- 1977-06-21 BE BE178632A patent/BE855932A/fr not_active IP Right Cessation
- 1977-06-21 JP JP7377577A patent/JPS5322456A/ja active Pending
- 1977-06-21 AU AU26259/77A patent/AU520695B2/en not_active Expired
- 1977-06-21 SE SE7707141A patent/SE433003B/xx not_active IP Right Cessation
- 1977-06-21 FR FR7719017A patent/FR2356191A1/fr active Granted
- 1977-06-21 SU SU772501304A patent/SU845804A3/ru active
- 1977-10-05 ES ES462916A patent/ES462916A1/es not_active Expired
-
1982
- 1982-08-27 SE SE8204900A patent/SE456775B/sv not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3544222A (en) * | 1966-10-13 | 1970-12-01 | Leybold Hochvakuum Anlagen Gmb | Optical instrument for determining layer thickness |
FR1558072A (fr) * | 1967-03-29 | 1969-02-21 | ||
US3491240A (en) * | 1967-03-29 | 1970-01-20 | Itek Corp | Noncontacting surface sensor |
FR1539538A (fr) * | 1967-10-05 | 1968-09-13 | Leybold Hochvakuum Anlagen Gmb | Instrument optique de mesure de l'épaisseur de couches déposées par métallisationsous vide |
US3737237A (en) * | 1971-11-18 | 1973-06-05 | Nasa | Monitoring deposition of films |
US3869211A (en) * | 1972-06-29 | 1975-03-04 | Canon Kk | Instrument for measuring thickness of thin film |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2531775A1 (fr) * | 1982-08-12 | 1984-02-17 | Cit Alcatel | Dispositif de mesure de l'epaisseur d'une couche deposee sur un substrat transparent |
EP0101997A1 (fr) * | 1982-08-12 | 1984-03-07 | COMPAGNIE INDUSTRIELLE DES TELECOMMUNICATIONS CIT-ALCATEL S.A. dite: | Dispositif de mesure de l'épaisseur d'une couche déposée sur un substrat transparent |
Also Published As
Publication number | Publication date |
---|---|
ZA773609B (en) | 1978-06-28 |
US4207835A (en) | 1980-06-17 |
CH616502A5 (fr) | 1980-03-31 |
AU2625977A (en) | 1979-01-04 |
AT366505B (de) | 1982-04-26 |
SE8204900D0 (sv) | 1982-08-27 |
JPS5322456A (en) | 1978-03-01 |
SE456775B (sv) | 1988-10-31 |
NL186235C (nl) | 1990-10-16 |
SE7707141L (sv) | 1977-12-22 |
ES459933A1 (es) | 1978-04-16 |
ATA434977A (de) | 1981-08-15 |
GB1567556A (en) | 1980-05-14 |
SE433003B (sv) | 1984-04-30 |
SU845804A3 (ru) | 1981-07-07 |
NL186235B (nl) | 1990-05-16 |
NL7706712A (nl) | 1977-12-23 |
CA1082486A (fr) | 1980-07-29 |
DE2627753C2 (de) | 1983-09-01 |
DE2627753A1 (de) | 1977-12-29 |
BE855932A (fr) | 1977-10-17 |
SE8204900L (sv) | 1982-08-27 |
AU520695B2 (en) | 1982-02-25 |
IT1086231B (it) | 1985-05-28 |
ES462916A1 (es) | 1978-06-16 |
GB1567555A (en) | 1980-05-14 |
FR2356191B1 (fr) | 1984-06-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
CN | Change in juridical nature | ||
ST | Notification of lapse |