JPS5320781A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5320781A
JPS5320781A JP9513576A JP9513576A JPS5320781A JP S5320781 A JPS5320781 A JP S5320781A JP 9513576 A JP9513576 A JP 9513576A JP 9513576 A JP9513576 A JP 9513576A JP S5320781 A JPS5320781 A JP S5320781A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
conductor layer
gates
specifying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9513576A
Other languages
Japanese (ja)
Inventor
Yokichi Ito
Eiji Takeda
Katsutada Horiuchi
Takaaki Hagiwara
Ryuji Kondo
Chikatake Uchiumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9513576A priority Critical patent/JPS5320781A/en
Publication of JPS5320781A publication Critical patent/JPS5320781A/en
Pending legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
  • Non-Volatile Memory (AREA)

Abstract

PURPOSE: To suppress the production of the protrusions of a second conductor layer, reduce the leakage current between gates and increase breakdown voltage by specifying the thickness of the insulation oxide film between the first conductor layer and second conductor layer in a semiconductor device having a double layer gate structure.
COPYRIGHT: (C)1978,JPO&Japio
JP9513576A 1976-08-10 1976-08-10 Production of semiconductor device Pending JPS5320781A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9513576A JPS5320781A (en) 1976-08-10 1976-08-10 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9513576A JPS5320781A (en) 1976-08-10 1976-08-10 Production of semiconductor device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP25750984A Division JPS60149167A (en) 1984-12-07 1984-12-07 Semiconductor device and manufacture thereof

Publications (1)

Publication Number Publication Date
JPS5320781A true JPS5320781A (en) 1978-02-25

Family

ID=14129365

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9513576A Pending JPS5320781A (en) 1976-08-10 1976-08-10 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5320781A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4917687A (en) * 1972-06-05 1974-02-16
JPS5012978A (en) * 1973-05-23 1975-02-10

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4917687A (en) * 1972-06-05 1974-02-16
JPS5012978A (en) * 1973-05-23 1975-02-10

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