JPS53144819A - Method of purifying silicon - Google Patents

Method of purifying silicon

Info

Publication number
JPS53144819A
JPS53144819A JP5899478A JP5899478A JPS53144819A JP S53144819 A JPS53144819 A JP S53144819A JP 5899478 A JP5899478 A JP 5899478A JP 5899478 A JP5899478 A JP 5899478A JP S53144819 A JPS53144819 A JP S53144819A
Authority
JP
Japan
Prior art keywords
purifying silicon
purifying
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5899478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5648441B2 (fr
Inventor
Ierugu Raato Haintsu
Jirutoru Eaharuto
Pufuaitsufueru Buarudemaaru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siltronic AG
Original Assignee
Wacker Siltronic AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Siltronic AG filed Critical Wacker Siltronic AG
Publication of JPS53144819A publication Critical patent/JPS53144819A/ja
Publication of JPS5648441B2 publication Critical patent/JPS5648441B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Photovoltaic Devices (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Detergent Compositions (AREA)
JP5899478A 1977-05-20 1978-05-19 Method of purifying silicon Granted JPS53144819A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772722783 DE2722783A1 (de) 1977-05-20 1977-05-20 Verfahren zum reinigen von silicium

Publications (2)

Publication Number Publication Date
JPS53144819A true JPS53144819A (en) 1978-12-16
JPS5648441B2 JPS5648441B2 (fr) 1981-11-16

Family

ID=6009446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5899478A Granted JPS53144819A (en) 1977-05-20 1978-05-19 Method of purifying silicon

Country Status (8)

Country Link
JP (1) JPS53144819A (fr)
BE (1) BE867204A (fr)
DE (1) DE2722783A1 (fr)
FR (1) FR2391157A1 (fr)
GB (1) GB1581418A (fr)
IT (1) IT1104837B (fr)
NL (1) NL7804064A (fr)
NO (1) NO781742L (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632319A (en) * 1979-08-16 1981-04-01 Consortium Elektrochem Ind Method of refining silicon material
JPS61178414A (ja) * 1985-01-31 1986-08-11 Nippon Chem Ind Co Ltd:The 高純度シリカおよびその製造方法
JPS6212608A (ja) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The 高純度シリカ及びその製造方法
JPH0722231U (ja) * 1993-09-27 1995-04-21 涌井工業株式会社 焼却器
JP2002037617A (ja) * 2000-07-28 2002-02-06 Kawasaki Steel Corp シリコンに付着した石英除去方法及び除去装置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3128979C2 (de) * 1981-07-22 1986-10-23 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von für Solarzellen verwendbarem Silizium
DE3210141A1 (de) * 1982-03-19 1983-09-22 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von fuer insbesondere solarzellen verwendbarem silicium
DE3317286A1 (de) * 1983-05-11 1984-11-22 Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen Verfahren zur reinigung von silicium durch saeureeinwirkung
DE3332447A1 (de) * 1983-09-08 1985-03-21 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur befreiung von siliciumbruchstuecken von verunreinigungen
JPH0429952Y2 (fr) * 1986-05-14 1992-07-20
NO180188C (no) * 1994-03-30 1997-03-05 Elkem Materials Fremgangsmåte for opparbeiding av residuer fra direkte syntese av organoklorsilaner og/eller klorsilaner
DE19531031C2 (de) * 1995-08-23 1997-08-21 Ictop Entwicklungsgesellschaft Verfahren zum Trocknen von Silizium
US5714203A (en) * 1995-08-23 1998-02-03 Ictop Entwicklungs Gmbh Procedure for the drying of silicon
JP4689373B2 (ja) * 2005-07-04 2011-05-25 シャープ株式会社 シリコンの再利用方法
GB2436520B (en) * 2006-03-28 2010-06-23 Hts Hans Torgersen & Sonn As Reclining group
CN101597063A (zh) * 2008-06-06 2009-12-09 佳科太阳能硅(厦门)有限公司 冶金硅中杂质硼的去除方法
DE102010053693A1 (de) * 2010-12-08 2012-06-14 Adensis Gmbh Verfahren zur chemischen Reinigung von metallurgischem Silizium und Vorrichtung zur Durchführung des Verfahrens
GB2563583A (en) 2017-06-16 2018-12-26 Her Majesty The Queen In Right Of Canada As Represented By The Mini Of Natural Resources Canada Combined grinding and leaching process for ores and wastes and apparatus thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1386227A (en) * 1919-09-26 1921-08-02 Electro Metallurg Co Process of refining crude electric-furnace silicon
CH332463A (de) * 1954-09-24 1958-09-15 Lonza Ag Verfahren zur Reinigung von Rohsilizium
CH346532A (de) * 1956-01-19 1960-05-31 Lonza Ag Verfahren zur Herstellung von reinem Siliziummetall
AT200106B (de) * 1956-12-24 1958-10-25 Degussa Verfahren zur Herstellung von reinstem Silizium
DE1091590B (de) * 1957-11-28 1960-10-27 Joergen August Kolflaath Verfahren zum Raffinieren von Ferro-Silizium und Silizium
NO122241B (fr) * 1970-05-04 1971-06-07 Spigerverk C

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632319A (en) * 1979-08-16 1981-04-01 Consortium Elektrochem Ind Method of refining silicon material
JPS61178414A (ja) * 1985-01-31 1986-08-11 Nippon Chem Ind Co Ltd:The 高純度シリカおよびその製造方法
JPH055766B2 (fr) * 1985-01-31 1993-01-25 Nippon Chemical Ind
JPS6212608A (ja) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The 高純度シリカ及びその製造方法
JPH0722231U (ja) * 1993-09-27 1995-04-21 涌井工業株式会社 焼却器
JP2002037617A (ja) * 2000-07-28 2002-02-06 Kawasaki Steel Corp シリコンに付着した石英除去方法及び除去装置
JP4686824B2 (ja) * 2000-07-28 2011-05-25 Ｊｆｅスチール株式会社 シリコンに付着した石英除去方法及び除去装置

Also Published As

Publication number Publication date
DE2722783A1 (de) 1978-11-30
JPS5648441B2 (fr) 1981-11-16
GB1581418A (en) 1980-12-10
NO781742L (no) 1978-11-21
NL7804064A (nl) 1978-11-22
DE2722783C2 (fr) 1987-05-27
FR2391157A1 (fr) 1978-12-15
IT1104837B (it) 1985-10-28
IT7849434A0 (it) 1978-05-18
FR2391157B1 (fr) 1980-04-04
BE867204A (fr) 1978-11-20

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