FR2391157B1 - - Google Patents

Info

Publication number
FR2391157B1
FR2391157B1 FR7814875A FR7814875A FR2391157B1 FR 2391157 B1 FR2391157 B1 FR 2391157B1 FR 7814875 A FR7814875 A FR 7814875A FR 7814875 A FR7814875 A FR 7814875A FR 2391157 B1 FR2391157 B1 FR 2391157B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7814875A
Other versions
FR2391157A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siltronic AG
Original Assignee
Wacker Siltronic AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Siltronic AG filed Critical Wacker Siltronic AG
Publication of FR2391157A1 publication Critical patent/FR2391157A1/fr
Application granted granted Critical
Publication of FR2391157B1 publication Critical patent/FR2391157B1/fr
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/037Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Photovoltaic Devices (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Detergent Compositions (AREA)
FR7814875A 1977-05-20 1978-05-19 Procede de purification du silicium Granted FR2391157A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772722783 DE2722783A1 (de) 1977-05-20 1977-05-20 Verfahren zum reinigen von silicium

Publications (2)

Publication Number Publication Date
FR2391157A1 FR2391157A1 (fr) 1978-12-15
FR2391157B1 true FR2391157B1 (fr) 1980-04-04

Family

ID=6009446

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7814875A Granted FR2391157A1 (fr) 1977-05-20 1978-05-19 Procede de purification du silicium

Country Status (8)

Country Link
JP (1) JPS53144819A (fr)
BE (1) BE867204A (fr)
DE (1) DE2722783A1 (fr)
FR (1) FR2391157A1 (fr)
GB (1) GB1581418A (fr)
IT (1) IT1104837B (fr)
NL (1) NL7804064A (fr)
NO (1) NO781742L (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2933164A1 (de) * 1979-08-16 1981-02-26 Consortium Elektrochem Ind Verfahren zum reinigen von rohsilicium
DE3128979C2 (de) * 1981-07-22 1986-10-23 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von für Solarzellen verwendbarem Silizium
DE3210141A1 (de) * 1982-03-19 1983-09-22 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von fuer insbesondere solarzellen verwendbarem silicium
DE3317286A1 (de) * 1983-05-11 1984-11-22 Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen Verfahren zur reinigung von silicium durch saeureeinwirkung
DE3332447A1 (de) * 1983-09-08 1985-03-21 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur befreiung von siliciumbruchstuecken von verunreinigungen
JPS61178414A (ja) * 1985-01-31 1986-08-11 Nippon Chem Ind Co Ltd:The 高純度シリカおよびその製造方法
JPS6212608A (ja) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The 高純度シリカ及びその製造方法
JPH0429952Y2 (fr) * 1986-05-14 1992-07-20
JP2553476Y2 (ja) * 1993-09-27 1997-11-05 涌井工業株式会社 焼却器
NO180188C (no) * 1994-03-30 1997-03-05 Elkem Materials Fremgangsmåte for opparbeiding av residuer fra direkte syntese av organoklorsilaner og/eller klorsilaner
DE19531031C2 (de) * 1995-08-23 1997-08-21 Ictop Entwicklungsgesellschaft Verfahren zum Trocknen von Silizium
US5714203A (en) * 1995-08-23 1998-02-03 Ictop Entwicklungs Gmbh Procedure for the drying of silicon
JP4686824B2 (ja) * 2000-07-28 2011-05-25 Jfeスチール株式会社 シリコンに付着した石英除去方法及び除去装置
JP4689373B2 (ja) * 2005-07-04 2011-05-25 シャープ株式会社 シリコンの再利用方法
GB2436520B (en) * 2006-03-28 2010-06-23 Hts Hans Torgersen & Sonn As Reclining group
CN101597063A (zh) * 2008-06-06 2009-12-09 佳科太阳能硅(厦门)有限公司 冶金硅中杂质硼的去除方法
DE102010053693A1 (de) * 2010-12-08 2012-06-14 Adensis Gmbh Verfahren zur chemischen Reinigung von metallurgischem Silizium und Vorrichtung zur Durchführung des Verfahrens
GB2563583A (en) 2017-06-16 2018-12-26 Her Majesty The Queen In Right Of Canada As Represented By The Mini Of Natural Resources Canada Combined grinding and leaching process for ores and wastes and apparatus thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1386227A (en) * 1919-09-26 1921-08-02 Electro Metallurg Co Process of refining crude electric-furnace silicon
CH332463A (de) * 1954-09-24 1958-09-15 Lonza Ag Verfahren zur Reinigung von Rohsilizium
CH346532A (de) * 1956-01-19 1960-05-31 Lonza Ag Verfahren zur Herstellung von reinem Siliziummetall
AT200106B (de) * 1956-12-24 1958-10-25 Degussa Verfahren zur Herstellung von reinstem Silizium
DE1091590B (de) * 1957-11-28 1960-10-27 Joergen August Kolflaath Verfahren zum Raffinieren von Ferro-Silizium und Silizium
NO122241B (fr) * 1970-05-04 1971-06-07 Spigerverk C

Also Published As

Publication number Publication date
DE2722783A1 (de) 1978-11-30
JPS5648441B2 (fr) 1981-11-16
GB1581418A (en) 1980-12-10
NO781742L (no) 1978-11-21
NL7804064A (nl) 1978-11-22
DE2722783C2 (fr) 1987-05-27
FR2391157A1 (fr) 1978-12-15
IT1104837B (it) 1985-10-28
JPS53144819A (en) 1978-12-16
IT7849434A0 (it) 1978-05-18
BE867204A (fr) 1978-11-20

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Legal Events

Date Code Title Description
ST Notification of lapse