JPS53126869A - Etching treatment method of semiconductors - Google Patents
Etching treatment method of semiconductorsInfo
- Publication number
- JPS53126869A JPS53126869A JP4133477A JP4133477A JPS53126869A JP S53126869 A JPS53126869 A JP S53126869A JP 4133477 A JP4133477 A JP 4133477A JP 4133477 A JP4133477 A JP 4133477A JP S53126869 A JPS53126869 A JP S53126869A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductors
- treatment method
- etching treatment
- etching
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4133477A JPS53126869A (en) | 1977-04-13 | 1977-04-13 | Etching treatment method of semiconductors |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4133477A JPS53126869A (en) | 1977-04-13 | 1977-04-13 | Etching treatment method of semiconductors |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53126869A true JPS53126869A (en) | 1978-11-06 |
Family
ID=12605614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4133477A Pending JPS53126869A (en) | 1977-04-13 | 1977-04-13 | Etching treatment method of semiconductors |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53126869A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02100377A (ja) * | 1988-10-07 | 1990-04-12 | Fuji Electric Co Ltd | シリコン放射線検出素子の製造方法 |
US5051134A (en) * | 1990-01-26 | 1991-09-24 | Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe M.B.H. | Process for the wet-chemical treatment of semiconductor surfaces |
-
1977
- 1977-04-13 JP JP4133477A patent/JPS53126869A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02100377A (ja) * | 1988-10-07 | 1990-04-12 | Fuji Electric Co Ltd | シリコン放射線検出素子の製造方法 |
US5051134A (en) * | 1990-01-26 | 1991-09-24 | Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe M.B.H. | Process for the wet-chemical treatment of semiconductor surfaces |
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