JPS52114275A - Etching method of semi-insulating film - Google Patents
Etching method of semi-insulating filmInfo
- Publication number
- JPS52114275A JPS52114275A JP3156476A JP3156476A JPS52114275A JP S52114275 A JPS52114275 A JP S52114275A JP 3156476 A JP3156476 A JP 3156476A JP 3156476 A JP3156476 A JP 3156476A JP S52114275 A JPS52114275 A JP S52114275A
- Authority
- JP
- Japan
- Prior art keywords
- semi
- insulating film
- etching method
- etching
- roughing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To etch the surface of a Si semiconductor without roughing the same by etching poly-Si containing O2 in an etching solution of a mixture of HF and NH4F by adding ultrasonic waves.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3156476A JPS52114275A (en) | 1976-03-22 | 1976-03-22 | Etching method of semi-insulating film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3156476A JPS52114275A (en) | 1976-03-22 | 1976-03-22 | Etching method of semi-insulating film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52114275A true JPS52114275A (en) | 1977-09-24 |
Family
ID=12334664
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3156476A Pending JPS52114275A (en) | 1976-03-22 | 1976-03-22 | Etching method of semi-insulating film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52114275A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011503906A (en) * | 2007-11-20 | 2011-01-27 | アンスティチュ ポリテクニック ド グルノーブル | Selective etching method and apparatus |
-
1976
- 1976-03-22 JP JP3156476A patent/JPS52114275A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011503906A (en) * | 2007-11-20 | 2011-01-27 | アンスティチュ ポリテクニック ド グルノーブル | Selective etching method and apparatus |
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