JPS52114275A - Etching method of semi-insulating film - Google Patents

Etching method of semi-insulating film

Info

Publication number
JPS52114275A
JPS52114275A JP3156476A JP3156476A JPS52114275A JP S52114275 A JPS52114275 A JP S52114275A JP 3156476 A JP3156476 A JP 3156476A JP 3156476 A JP3156476 A JP 3156476A JP S52114275 A JPS52114275 A JP S52114275A
Authority
JP
Japan
Prior art keywords
semi
insulating film
etching method
etching
roughing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3156476A
Other languages
Japanese (ja)
Inventor
Masaki Okayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP3156476A priority Critical patent/JPS52114275A/en
Publication of JPS52114275A publication Critical patent/JPS52114275A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To etch the surface of a Si semiconductor without roughing the same by etching poly-Si containing O2 in an etching solution of a mixture of HF and NH4F by adding ultrasonic waves.
COPYRIGHT: (C)1977,JPO&Japio
JP3156476A 1976-03-22 1976-03-22 Etching method of semi-insulating film Pending JPS52114275A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3156476A JPS52114275A (en) 1976-03-22 1976-03-22 Etching method of semi-insulating film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3156476A JPS52114275A (en) 1976-03-22 1976-03-22 Etching method of semi-insulating film

Publications (1)

Publication Number Publication Date
JPS52114275A true JPS52114275A (en) 1977-09-24

Family

ID=12334664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3156476A Pending JPS52114275A (en) 1976-03-22 1976-03-22 Etching method of semi-insulating film

Country Status (1)

Country Link
JP (1) JPS52114275A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011503906A (en) * 2007-11-20 2011-01-27 アンスティチュ ポリテクニック ド グルノーブル Selective etching method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011503906A (en) * 2007-11-20 2011-01-27 アンスティチュ ポリテクニック ド グルノーブル Selective etching method and apparatus

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