JPS53114679A - Plasm etching unit - Google Patents

Plasm etching unit

Info

Publication number
JPS53114679A
JPS53114679A JP2971877A JP2971877A JPS53114679A JP S53114679 A JPS53114679 A JP S53114679A JP 2971877 A JP2971877 A JP 2971877A JP 2971877 A JP2971877 A JP 2971877A JP S53114679 A JPS53114679 A JP S53114679A
Authority
JP
Japan
Prior art keywords
etching unit
plasm
plasm etching
etch
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2971877A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6124817B2 (enExample
Inventor
Masanao Itoga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2971877A priority Critical patent/JPS53114679A/ja
Publication of JPS53114679A publication Critical patent/JPS53114679A/ja
Publication of JPS6124817B2 publication Critical patent/JPS6124817B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP2971877A 1977-03-17 1977-03-17 Plasm etching unit Granted JPS53114679A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2971877A JPS53114679A (en) 1977-03-17 1977-03-17 Plasm etching unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2971877A JPS53114679A (en) 1977-03-17 1977-03-17 Plasm etching unit

Publications (2)

Publication Number Publication Date
JPS53114679A true JPS53114679A (en) 1978-10-06
JPS6124817B2 JPS6124817B2 (enExample) 1986-06-12

Family

ID=12283881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2971877A Granted JPS53114679A (en) 1977-03-17 1977-03-17 Plasm etching unit

Country Status (1)

Country Link
JP (1) JPS53114679A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55118637A (en) * 1979-03-06 1980-09-11 Chiyou Lsi Gijutsu Kenkyu Kumiai Plasma etching apparatus
JPS5664437A (en) * 1979-08-22 1981-06-01 Onera (Off Nat Aerospatiale) Method and device for chemically etching integrated circuit by dry process
JPS5750435A (en) * 1980-09-11 1982-03-24 Toshiba Corp Plasma etching device
US4433214A (en) * 1981-12-24 1984-02-21 Motorola, Inc. Acoustical transducer with a slotted piston suspension
JPS60140763U (ja) * 1984-02-24 1985-09-18 日本電子株式会社 プラズマ装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48103433A (enExample) * 1972-04-17 1973-12-25

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48103433A (enExample) * 1972-04-17 1973-12-25

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55118637A (en) * 1979-03-06 1980-09-11 Chiyou Lsi Gijutsu Kenkyu Kumiai Plasma etching apparatus
JPS5664437A (en) * 1979-08-22 1981-06-01 Onera (Off Nat Aerospatiale) Method and device for chemically etching integrated circuit by dry process
JPS5750435A (en) * 1980-09-11 1982-03-24 Toshiba Corp Plasma etching device
US4433214A (en) * 1981-12-24 1984-02-21 Motorola, Inc. Acoustical transducer with a slotted piston suspension
JPS60140763U (ja) * 1984-02-24 1985-09-18 日本電子株式会社 プラズマ装置

Also Published As

Publication number Publication date
JPS6124817B2 (enExample) 1986-06-12

Similar Documents

Publication Publication Date Title
JPS56152973A (en) Sputter etching device
JPS53114679A (en) Plasm etching unit
JPS5440079A (en) Plasma etching method
JPS5432143A (en) Etching process
JPS53110378A (en) Plasma carrying device
JPS51127671A (en) Power supply for electron gun
JPS5531639A (en) Forming method for electric wiring
JPS538847A (en) High frequency heater
JPS5384684A (en) Plasma etching device
JPS5252099A (en) Plasma ion source
JPS54866A (en) Molecular beam crystal growing device
JPS5376757A (en) Photoetching method
JPS5257543A (en) High frequency heater
JPS51146183A (en) High frequency wave ion plating device
JPS5335363A (en) Field radiation type cathode
JPS5421278A (en) Plasma etching method
JPS53106574A (en) Production of photoetching mask for production of semiconductor device
JPS5430773A (en) Electron-beam device having vacuum isolation film inside sample chamber
JPS5338277A (en) Production of semiconductor device
JPS544567A (en) Growing apparatus of ion beam crystal
JPS57174465A (en) High frequency ion etching device
JPS5213778A (en) Plasma-etching method
JPS52154351A (en) Formation of electrode contact holes in semiconductor devices
JPS5335361A (en) Gate trigger circuit of thyristor
JPS51148366A (en) Pattern formation method