JPS5277686A - Manufacture of semiconductor diaphragm - Google Patents

Manufacture of semiconductor diaphragm

Info

Publication number
JPS5277686A
JPS5277686A JP50155307A JP15530775A JPS5277686A JP S5277686 A JPS5277686 A JP S5277686A JP 50155307 A JP50155307 A JP 50155307A JP 15530775 A JP15530775 A JP 15530775A JP S5277686 A JPS5277686 A JP S5277686A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor diaphragm
setting
etching
parallelism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50155307A
Other languages
Japanese (ja)
Other versions
JPS5936434B2 (en
Inventor
Tetsuo Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP50155307A priority Critical patent/JPS5936434B2/en
Publication of JPS5277686A publication Critical patent/JPS5277686A/en
Publication of JPS5936434B2 publication Critical patent/JPS5936434B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Pressure Sensors (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To get precisely the parallelism and the thickness of the pressure-sensitive part by easily setting ion implantation and epitaxial layers by setting stp layer which is resistant against etching solution in semiconductor substrate and automatically stopping the etching.
COPYRIGHT: (C)1977,JPO&Japio
JP50155307A 1975-12-24 1975-12-24 Hand tied diaphragm no. Expired JPS5936434B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50155307A JPS5936434B2 (en) 1975-12-24 1975-12-24 Hand tied diaphragm no.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50155307A JPS5936434B2 (en) 1975-12-24 1975-12-24 Hand tied diaphragm no.

Publications (2)

Publication Number Publication Date
JPS5277686A true JPS5277686A (en) 1977-06-30
JPS5936434B2 JPS5936434B2 (en) 1984-09-04

Family

ID=15603028

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50155307A Expired JPS5936434B2 (en) 1975-12-24 1975-12-24 Hand tied diaphragm no.

Country Status (1)

Country Link
JP (1) JPS5936434B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037177A (en) * 1983-08-09 1985-02-26 Nec Corp semiconductor pressure sensor
JPS60158675A (en) * 1984-01-27 1985-08-20 Hitachi Ltd Diaphragm sensor

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59195429U (en) * 1983-06-15 1984-12-26 株式会社　ほくさん Indoor temperature control device
JPH0390705U (en) * 1989-12-28 1991-09-17

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037177A (en) * 1983-08-09 1985-02-26 Nec Corp semiconductor pressure sensor
JPS60158675A (en) * 1984-01-27 1985-08-20 Hitachi Ltd Diaphragm sensor
US4670969A (en) * 1984-01-27 1987-06-09 Hitachi, Ltd. Method of making silicon diaphragm pressure sensor

Also Published As

Publication number Publication date
JPS5936434B2 (en) 1984-09-04

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