JPS5268897A - Etching of silicon dioxide film - Google Patents
Etching of silicon dioxide filmInfo
- Publication number
- JPS5268897A JPS5268897A JP50145698A JP14569875A JPS5268897A JP S5268897 A JPS5268897 A JP S5268897A JP 50145698 A JP50145698 A JP 50145698A JP 14569875 A JP14569875 A JP 14569875A JP S5268897 A JPS5268897 A JP S5268897A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- silicon dioxide
- dioxide film
- film
- economically
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Silicon Compounds (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50145698A JPS5268897A (en) | 1975-12-06 | 1975-12-06 | Etching of silicon dioxide film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50145698A JPS5268897A (en) | 1975-12-06 | 1975-12-06 | Etching of silicon dioxide film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5268897A true JPS5268897A (en) | 1977-06-08 |
Family
ID=15391029
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50145698A Pending JPS5268897A (en) | 1975-12-06 | 1975-12-06 | Etching of silicon dioxide film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5268897A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4497683A (en) * | 1982-05-03 | 1985-02-05 | At&T Bell Laboratories | Process for producing dielectrically isolated silicon devices |
US4498951A (en) * | 1981-10-09 | 1985-02-12 | Hitachi, Ltd. | Method of manufacturing single-crystal film |
-
1975
- 1975-12-06 JP JP50145698A patent/JPS5268897A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4498951A (en) * | 1981-10-09 | 1985-02-12 | Hitachi, Ltd. | Method of manufacturing single-crystal film |
US4497683A (en) * | 1982-05-03 | 1985-02-05 | At&T Bell Laboratories | Process for producing dielectrically isolated silicon devices |
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