JPS5255475A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5255475A
JPS5255475A JP50131593A JP13159375A JPS5255475A JP S5255475 A JPS5255475 A JP S5255475A JP 50131593 A JP50131593 A JP 50131593A JP 13159375 A JP13159375 A JP 13159375A JP S5255475 A JPS5255475 A JP S5255475A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
patterns
oxidiation
ics
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50131593A
Other languages
Japanese (ja)
Other versions
JPS5917865B2 (en
Inventor
Eisuke Ichinohe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13159375A priority Critical patent/JPS5917865B2/en
Publication of JPS5255475A publication Critical patent/JPS5255475A/en
Publication of JPS5917865B2 publication Critical patent/JPS5917865B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE:To facilitate production of ICs with minute patterns by selectively oxidizing a poly Si layer through the use of an oxidiation resistant film and flattening the surface through oxidation and insulating with the same patterns.
JP13159375A 1975-10-31 1975-10-31 hand tai souchi no seizou houhou Expired JPS5917865B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13159375A JPS5917865B2 (en) 1975-10-31 1975-10-31 hand tai souchi no seizou houhou

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13159375A JPS5917865B2 (en) 1975-10-31 1975-10-31 hand tai souchi no seizou houhou

Publications (2)

Publication Number Publication Date
JPS5255475A true JPS5255475A (en) 1977-05-06
JPS5917865B2 JPS5917865B2 (en) 1984-04-24

Family

ID=15061669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13159375A Expired JPS5917865B2 (en) 1975-10-31 1975-10-31 hand tai souchi no seizou houhou

Country Status (1)

Country Link
JP (1) JPS5917865B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54140483A (en) * 1978-04-21 1979-10-31 Nec Corp Semiconductor device
JPS54160182A (en) * 1978-06-06 1979-12-18 Rockwell International Corp Method of forming self matching contact for semiconductor device
JPS5694775A (en) * 1979-12-28 1981-07-31 Chiyou Lsi Gijutsu Kenkyu Kumiai Semiconductor device
JPS59108317A (en) * 1982-12-13 1984-06-22 Mitsubishi Electric Corp Forming method of electrode wiring

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63152567U (en) * 1987-03-25 1988-10-06
JPH01179278U (en) * 1988-06-08 1989-12-22

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54140483A (en) * 1978-04-21 1979-10-31 Nec Corp Semiconductor device
JPS54160182A (en) * 1978-06-06 1979-12-18 Rockwell International Corp Method of forming self matching contact for semiconductor device
JPS5694775A (en) * 1979-12-28 1981-07-31 Chiyou Lsi Gijutsu Kenkyu Kumiai Semiconductor device
JPS59108317A (en) * 1982-12-13 1984-06-22 Mitsubishi Electric Corp Forming method of electrode wiring

Also Published As

Publication number Publication date
JPS5917865B2 (en) 1984-04-24

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