JPS5253778A - Ion plating apparatus - Google Patents

Ion plating apparatus

Info

Publication number
JPS5253778A
JPS5253778A JP13009775A JP13009775A JPS5253778A JP S5253778 A JPS5253778 A JP S5253778A JP 13009775 A JP13009775 A JP 13009775A JP 13009775 A JP13009775 A JP 13009775A JP S5253778 A JPS5253778 A JP S5253778A
Authority
JP
Japan
Prior art keywords
ion plating
plating apparatus
plated
ionization
impurities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13009775A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5521109B2 (en, 2012
Inventor
Yoichi Murayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP13009775A priority Critical patent/JPS5253778A/ja
Publication of JPS5253778A publication Critical patent/JPS5253778A/ja
Publication of JPS5521109B2 publication Critical patent/JPS5521109B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP13009775A 1975-10-29 1975-10-29 Ion plating apparatus Granted JPS5253778A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13009775A JPS5253778A (en) 1975-10-29 1975-10-29 Ion plating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13009775A JPS5253778A (en) 1975-10-29 1975-10-29 Ion plating apparatus

Publications (2)

Publication Number Publication Date
JPS5253778A true JPS5253778A (en) 1977-04-30
JPS5521109B2 JPS5521109B2 (en, 2012) 1980-06-07

Family

ID=15025872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13009775A Granted JPS5253778A (en) 1975-10-29 1975-10-29 Ion plating apparatus

Country Status (1)

Country Link
JP (1) JPS5253778A (en, 2012)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6210267A (ja) * 1985-07-05 1987-01-19 Seiko Electronic Components Ltd イオンプレーティング装置
JPS63105960A (ja) * 1986-06-07 1988-05-11 Kawasaki Steel Corp 密着性に優れたイオンプレ−テイング被膜をそなえる金属ストリツプの製造方法およびイオンプレ−テイング装置
US5474611A (en) * 1992-05-20 1995-12-12 Yoichi Murayama, Shincron Co., Ltd. Plasma vapor deposition apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS474926U (en, 2012) * 1971-02-03 1972-09-13
JPS4879736A (en, 2012) * 1972-01-27 1973-10-25
JPS49120877A (en, 2012) * 1973-03-20 1974-11-19
JPS5022780A (en, 2012) * 1973-07-03 1975-03-11

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS474926U (en, 2012) * 1971-02-03 1972-09-13
JPS4879736A (en, 2012) * 1972-01-27 1973-10-25
JPS49120877A (en, 2012) * 1973-03-20 1974-11-19
JPS5022780A (en, 2012) * 1973-07-03 1975-03-11

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6210267A (ja) * 1985-07-05 1987-01-19 Seiko Electronic Components Ltd イオンプレーティング装置
JPS63105960A (ja) * 1986-06-07 1988-05-11 Kawasaki Steel Corp 密着性に優れたイオンプレ−テイング被膜をそなえる金属ストリツプの製造方法およびイオンプレ−テイング装置
US5474611A (en) * 1992-05-20 1995-12-12 Yoichi Murayama, Shincron Co., Ltd. Plasma vapor deposition apparatus

Also Published As

Publication number Publication date
JPS5521109B2 (en, 2012) 1980-06-07

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